2009
DOI: 10.1109/tasc.2009.2019243
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Epitaxial Growth of Sputtered Ultra-Thin NbN Layers and Junctions on Sapphire

Abstract: HAL is a multidisciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des labora… Show more

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Cited by 43 publications
(33 citation statements)
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“…• C in our case 9 as shown on Fig.2. The accessible technology led to the choice of a Si 3 N 4 ridge waveguide, with a refractive index of 1.96 measured by ellipsometry, deposited over a 1-D array of 24 epi-NbN nanowires grown on R-Sapphire substrate.…”
Section: A Technological Constraints On Device Designsupporting
confidence: 54%
See 1 more Smart Citation
“…• C in our case 9 as shown on Fig.2. The accessible technology led to the choice of a Si 3 N 4 ridge waveguide, with a refractive index of 1.96 measured by ellipsometry, deposited over a 1-D array of 24 epi-NbN nanowires grown on R-Sapphire substrate.…”
Section: A Technological Constraints On Device Designsupporting
confidence: 54%
“…3. A 4nm-thick epitaxial NbN is first DC-magnetron sputtered on the heated R-plane Sapphire 4-inch wafer, 9 and patterned afterwards by electron-beam lithography with a VB6 UHR tool from VISTEC, using the negative tone resist NEB35 from Sumitomo. This resist, with a thickness of 45nm, allows good reproducibility of ∼40nm wide nanowires and 160nm pitch with 90μC/cm 2 dose to size (±10% process window).…”
Section: Device Fabricationmentioning
confidence: 99%
“…NbN layers were deposited by dc magnetron sputtering from a six-inches diameter niobium target in a reactive (nitrogen/argon) gas mixture at 300 C. The same target is used for Nb deposition applying only argon pressure, whereas the MgO layer is rf-magnetron sputtered from an MgO target. More details on the technique can be found in [9]. The NbN top layer is further reactive ion etched on a part of the wafer to provide the bulk niobium reference sample (Ref).…”
Section: Methodsmentioning
confidence: 99%
“…• C temperature range [1,9]. According to literature, NbN growth on the MgO substrate results in the best values of T c , e.g., T c = 12 K for a 4 nm thick film [10].…”
Section: Introductionmentioning
confidence: 97%