This paper describes a method for the reproducible Si-doping of GaAs epitaxial material in the range of 1x1016 to 2x1019 cm -3, using a SiCly + AsCl liquid source in a GaAs + Ga /H2 /AsC13 chemical vapor deposition process.Excellent electron mobilities have been achieved for a variety of Si doped GaAs samples. Power FET devices made from this material have demonstrated output power densities of 0.86 watts /mm at 10 GHz. Low noise FET devices made from this material have demonstrated a noise figure of 2.2 dB with 8.5 dB associated gain at 12 GHz.