2017
DOI: 10.1088/1361-6528/aa752e
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Epitaxial graphene growth on FIB patterned 3C-SiC nanostructures on Si (111): reducing milling damage

Abstract: Epitaxial growth of graphene on SiC is a scalable procedure that does not require any further transfer step, making this an ideal platform for graphene nanostructure fabrication. Focused ion beam (FIB) is a very promising tool for exploring the reduction of the lateral dimension of graphene on SiC to the nanometre scale. However, exposure of graphene to the Ga beam causes significant surface damage through amorphisation and contamination, preventing epitaxial graphene growth. In this paper we demonstrate that … Show more

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Cited by 9 publications
(8 citation statements)
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“…A NW was moved and transferred by a weasel hair and then fixed by conductive Ag epoxy in air (Figures and ). This approach eliminates contaminations induced by traditional beam depositions. Healed mismatched amorphous fractured surfaces of a NW are observed in Figure b. Healing on mismatched amorphous fractured brittle NWs was characterized and measured, by in situ TEM fracture tests, as illustrated in Figures –.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…A NW was moved and transferred by a weasel hair and then fixed by conductive Ag epoxy in air (Figures and ). This approach eliminates contaminations induced by traditional beam depositions. Healed mismatched amorphous fractured surfaces of a NW are observed in Figure b. Healing on mismatched amorphous fractured brittle NWs was characterized and measured, by in situ TEM fracture tests, as illustrated in Figures –.…”
Section: Discussionmentioning
confidence: 99%
“…However, to the best of our knowledge, nanomechanical testing on mismatched fractured brittle NWs has not been reported. Additionally, focused-ion-beam (FIB) and electron beam depositions are widely employed to fix and connect NWs in transmission electron microscopy (TEM). Nevertheless, the two depositions readily induce damages and contaminations on the NWs that affect performance . Using deposition techniques on NWs, the measured results by nanomechanical testing have risks in reliability and robust design of high performance NW devices.…”
mentioning
confidence: 99%
“…Atomic hydrogen exposure was achieved using EFM-H atomic hydrogen source (FOCUS GmbH) operating at an apparent chamber pressure of ∼5×10 −6 mbar and 40 W power. Atomic hydrogen etching assists with elimination of contamination and improving the flatness of the SiC surface, and has been routinely employed as a preparation step prior to graphene fabrication [48][49][50].…”
Section: Methodsmentioning
confidence: 99%
“…Then, a number of works demonstrating the feasibility of graphene synthesis on β-SiC/Si wafers of different orientations have been published . Mostly, these studies have been conducted on β-SiC (111) thin films [51][52][53][54][55][56][57][58][59][60][61][65][66][67][68][69][70][71][72][73][74][75][76][77][78][79][80][81] and single-crystalline SiC (111) wafers [62][63][64]. However, some studies have been carried out on β-SiC(001) [50, 61, 82-93, 101, 102] and even on polycrystalline β-SiC substrates [94].…”
Section: Introductionmentioning
confidence: 99%