1995
DOI: 10.1063/1.115419
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Epitaxial electro-optical SrxBa1−xNb2O6 films by single-source plasma-enhanced metalorganic chemical vapor deposition

Abstract: SrxBa1−xNb2O6 films have been epitaxially grown on MgO substrates by a single-source plasma-enhanced chemical vapor deposition (PE-CVD). Exceptionally high quality of the epitaxial films was observed as indicated by high-resolution synchrotron x-ray diffraction imaging. The films exhibit waveguiding behavior with values of refractive index and the linear electro-optic coefficient r51 close to those of bulk crystals.

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Cited by 15 publications
(7 citation statements)
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“…9 Recently, the nondiagonal electro-optic coefficient, r 51 , was measured in SBN:60 films grown using plasma-enhanced metalorganic chemical vapor deposition. 12 The largest electro-optic coefficient in SBN films is, however, the r 33 coefficient. In this letter we describe a modulated diffraction technique using a reflection grating to measure the r 33 coefficient in SBN:60 films deposited using pulsed laser deposition.…”
mentioning
confidence: 99%
“…9 Recently, the nondiagonal electro-optic coefficient, r 51 , was measured in SBN:60 films grown using plasma-enhanced metalorganic chemical vapor deposition. 12 The largest electro-optic coefficient in SBN films is, however, the r 33 coefficient. In this letter we describe a modulated diffraction technique using a reflection grating to measure the r 33 coefficient in SBN:60 films deposited using pulsed laser deposition.…”
mentioning
confidence: 99%
“…4, where ␥ peaks close to xϭ0.3 and s peaks at xϭ0. 5. The fact that xϭ0.3 shows a larger hysteresis than xϭ0.5 also implies that there is a coexistence of both ferroelectric and cubic phases in the films and the relative amount of the ferroelectric phase decreases as x increases.…”
Section: Lawrence Berkeley National Laboratory Berkeley California mentioning
confidence: 95%
“…Direct EO screening becomes technically difficult due not only to the small sample area that is hard to address with electrodes, but also to the thin film thickness that requires a highly sensitive EO measurement system. [3][4][5][6] In this letter, a birefringence measurement method has been modified to obtain the required high sensitivity for rapid analysis of the EO properties of small thin films.…”
Section: Lawrence Berkeley National Laboratory Berkeley California mentioning
confidence: 99%
“…A variety of ferroelectric thin films have been investigated as promising candidates for E-O applications; they include lanthanum modified lead zirconate titanate, barium titanate, lead magnesium niobate-lead titanate, lithium niobate, and strontium barium niobate. [5][6][7][8][9] However, to produce high-quality thin films with good optical clarity and low optical loss for waveguide applications is still a challenging task.…”
Section: Introductionmentioning
confidence: 99%