2016
DOI: 10.1149/07219.0023ecst
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Environmental-Friendly Fluorine Mixture for CVD Cleaning Processes to Replace C2F6, CF4 and NF3

Abstract: The target of this work was to find viable alternative CVD-cleaning gas mixtures for the semiconductor industry, which are environmental-friendly and in addition can be used as a “drop in” to avoid high investment costs from equipment modification. Our study has demonstrated that this can be achieved with F2-based gas mixtures, which also provide a more efficient and faster cleaning behavior for most applications. A cleaning efficiency gain of a factor 1.3 up to 17 can be expected, relative to the F2-amount re… Show more

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Cited by 7 publications
(5 citation statements)
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“…To substitute NF3 in cleaning recipes, a solution with F2 whose GWP is null has been evaluated for deposition chambers [15]. Advantages of this molecule is their easy dissociation power into HF into atmosphere allowing a GWP equal to zero.…”
Section: F2 Evaluationmentioning
confidence: 99%
“…To substitute NF3 in cleaning recipes, a solution with F2 whose GWP is null has been evaluated for deposition chambers [15]. Advantages of this molecule is their easy dissociation power into HF into atmosphere allowing a GWP equal to zero.…”
Section: F2 Evaluationmentioning
confidence: 99%
“…Studies have been conducted to replace NF 3 [16,17]. Among them, F 3 NO was considered a candidate gas to replace NF 3 [18].…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the measurement of radical species and density is applied to theoretical calculations to improve the accuracy of process calculation results. Moreover, energy and mass distribution measurements of ions and radicals are required for new gases, such as eco-friendly process gases [11][12][13]. To this end, we aim to contribute to the data generation for new gases using a diagnostic device.…”
Section: Introductionmentioning
confidence: 99%