2008
DOI: 10.1016/j.msec.2007.10.071
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Enhancement of the 2DEG density in AlGaAs/InGaAs/GaAs P-HEMTs structures grown by MBE on (311)A and (111)A GaAs substrates

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Cited by 4 publications
(2 citation statements)
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“…Silicon is widely used as the n-type dopant in GaAs growth using MBE. When silicon (Si) donors are localized into an atomic plane during epitaxial growth, a sheet of ionized donors produces a potential well that confines the electron motion along the direction perpendicular to a delta-doped plane and leads to the formation of a two-dimensional electron gas (2DEG) [1][2][3][4][5].…”
Section: Introductionmentioning
confidence: 99%
“…Silicon is widely used as the n-type dopant in GaAs growth using MBE. When silicon (Si) donors are localized into an atomic plane during epitaxial growth, a sheet of ionized donors produces a potential well that confines the electron motion along the direction perpendicular to a delta-doped plane and leads to the formation of a two-dimensional electron gas (2DEG) [1][2][3][4][5].…”
Section: Introductionmentioning
confidence: 99%
“…However, heterojunctions grown on high index GaAs substrates ((N 1 1) planes with N Z1) of GaAs substrates have shown optical and transport properties that are better than those obtained in samples grown on (1 0 0) surfaces [24][25][26][27]. Mobility enhancement in the two-dimensional hole gas was also observed in GaAs/AlGaAs heterostructures grown on (3 1 1)A surfaces using silicon as an acceptor [28].…”
Section: Introductionmentioning
confidence: 97%