“…Silicon is widely used as the n-type dopant in GaAs growth using MBE. When silicon (Si) donors are localized into an atomic plane during epitaxial growth, a sheet of ionized donors produces a potential well that confines the electron motion along the direction perpendicular to a delta-doped plane and leads to the formation of a two-dimensional electron gas (2DEG) [1][2][3][4][5].…”