2021
DOI: 10.1016/j.tsf.2021.138709
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Enhancement of metal-insulator transition performance of VO2 thin films by conventional furnace annealing

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Cited by 12 publications
(4 citation statements)
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“…It is significant to note that in our previous work on silicon substrates, a similar limit in the amplitude of the resistivity switch was also observed [41]. Liang et al [40] achieve interesting improvements in ∆𝑅 by applying two successive annealings (rapid thermal annealing followed by conventional annealing at lower temperature) to increase the grain size of the obtained VO2 grains.…”
Section: Electrical Properties Of Oxides Formed Using V and Vn Precur...supporting
confidence: 80%
See 1 more Smart Citation
“…It is significant to note that in our previous work on silicon substrates, a similar limit in the amplitude of the resistivity switch was also observed [41]. Liang et al [40] achieve interesting improvements in ∆𝑅 by applying two successive annealings (rapid thermal annealing followed by conventional annealing at lower temperature) to increase the grain size of the obtained VO2 grains.…”
Section: Electrical Properties Of Oxides Formed Using V and Vn Precur...supporting
confidence: 80%
“…However, an accurate control of the coupling temperature/oxidation duration (i.e. thermal oxidation of the vanadium precursor film) represents the most critical issue in the processing development for a given thickness of the initial vanadium layer precursor [29,32,[37][38][39][40]. Recently, we have demonstrated the possibility to take benefit of this two-stage strategy by air oxidizing sputter-deposited vanadium nitride (VN) thin films to achieve thermochromic VO2 films [41,42].…”
Section: Introductionmentioning
confidence: 99%
“…An example of this engineering is using structural changes utilizing oxide growth, compositional, and morphological techniques to tune IMT properties to alter the electrical switching speed, 12,13 as well as optical 14,15 and optoelectronic properties. 16,17 Therefore, the fundamental understanding of this structural impact on IMTs is important in order to engineer VO x polymorphs that are t for purpose. Methods such as using specially oriented substrates, 18 dopants, 19 and ion implantation 20 induce strain, meaning that the oxide requires less energy to transition from the insulator to the metallic state.…”
Section: Introductionmentioning
confidence: 99%
“…31–33 Thus, a tremendous number of methods have been utilized to improve the phase transition properties and enhance the practical application potential of VO 2 . 4,34–37 Doping is a widely accepted effective approach to tune the phase transition temperature of VO 2 . 38–42 For example, Zhou et al reported that the metal–insulator transition temperature of Mg-doped VO 2 nanoparticles decreased by approximately 2 K per at% Mg, and the phase transition temperature of VO 2 with 7.0 at% Mg decreased to 54 °C.…”
Section: Introductionmentioning
confidence: 99%