Enhancement of Diamond Nucleation by Atomic Silicon Microaddition

Isshiki, Hideo; Yoshida, Mikio; Tobita, Ryutaro; Shigeeda, Tetsuya; Kinoshita, Motoi; Matsushima, Kenshiro; Tamura, Takashi

doi:10.1143/jjap.51.090108

Cited by 3 publications

(2 citation statements)

References 28 publications

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“…Two-step diamond growth on Si (100) substrate was performed by microwave-plasma-assisted chemical vapor deposition (MP-CVD) using CH4, H2 as source gases. The first process is highly oriented diamond nucleation using the bias enhanced nucleation method with atomic Si micro addition [3,4]. Mono-methyl silane (MMS: Si(CH3)H3) was used as an atomic silicon source.…”

Section: Methodsmentioning

confidence: 99%

Sharp and Intense Si-vacancy Center Emission from Diamond Cube Selective-grown on Si (100) Substrate

Isshiki¹,

Komiya²,

Kojima³

2015

Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials

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Section: Methodsmentioning

confidence: 99%

Sharp and Intense Si-vacancy Center Emission from Diamond Cube Selective-grown on Si (100) Substrate

Isshiki¹,

Komiya²,

Kojima³

2015

Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials

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“…The comparison of different sp 3 /sp 2 ratios is only accurate if the same excitation energy is used to acquire the spectra and if determined by the same method and mathematical expression. Several authors have used the ratio between the integral intensity of the diamond band (I diamond ) and the integral intensity of the G-band (I G ) (Isshiki et al, 2012). Others divide I diamond by the total integrated intensity of the Raman spectrum (I total ) (Salgueiredo et al, 2011;Štenclová et al, 2019).…”

Section: Presence Of Non-diamond Carbonmentioning

confidence: 99%

In-house vs. commercial boron-doped diamond electrodes for electrochemical degradation of water pollutants: A critical review

et al. 2023

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Boron-doped diamond (BDD) electrodes are eco-friendly and widely used in efficient water remediation through electrochemical advanced oxidation processes (EAOPs). These anodes can completely mineralize a wide range of pollutants, only requiring electrical energy. Over the last 2 decades, numerous commercially available BDD electrodes have emerged, but little is known about their electrooxidation performance, particularly if compared to laboratory-produced anodes by different research groups. In this critical review, a comparison between in-house-made and commercially available BDD electrodes based on a systematic literature review (SLR) is carried out. SLR was quite useful in locating and selecting the scientific publications relevant to the topic, enabling information gathering on dissemination, growth, and trends in the application of BDD electrodes in the degradation of water pollutants. More specifically, data concerning the origin of the employed BDD electrodes, and their physicochemical properties were extracted from a thorough selection of articles. Moreover, a detailed analysis of the main parameters affecting the BDD electrodes’ performance is provided and includes selection and pre-treatment of the substrate material, chemical vapor deposition (CVD) method, deposition parameters, characterization methods, and operational conditions. This discussion was carried out fully based on the numerous performance indicators found in the literature. Those clearly revealed that there are only a few analogous points across works, demonstrating the challenge of establishing an accurate comparison methodology. In this context, we propose a figure-of-merit equation which aims at normalizing BDD degradation results for a specific contaminant, even if working under different experimental conditions. Two case studies based on the degradation of solutions spiked with phenol and landfill leachate treatment with commercial or in-house-made BDD electrodes are also presented. Although it was not possible to conclude which electrode would be the best choice, we propose a set of guidelines detailing a consistent experimental procedure for comparison purposes in the future.

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Tetramethysilane-assisted enhancement of diamond nucleation on silicon substrate

Xiong

Zhuang

et al. 2018

Surface and Coatings Technology

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Enhancement of Diamond Nucleation by Atomic Silicon Microaddition

Cited by 3 publications

References 28 publications

Sharp and Intense Si-vacancy Center Emission from Diamond Cube Selective-grown on Si (100) Substrate

Sharp and Intense Si-vacancy Center Emission from Diamond Cube Selective-grown on Si (100) Substrate

In-house vs. commercial boron-doped diamond electrodes for electrochemical degradation of water pollutants: A critical review

Tetramethysilane-assisted enhancement of diamond nucleation on silicon substrate

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