2018
DOI: 10.1016/j.surfcoat.2018.06.087
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Tetramethysilane-assisted enhancement of diamond nucleation on silicon substrate

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Cited by 4 publications
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“…It is well known that the mixture of carbon source and hydrogen gas is the main reactant gas of CVD diamond coating deposition [8,9]. Hence, the substrate must possess the hydrocarbon adsorption capability, which can be regarded as the first step of generating diamond grains [10]. Meanwhile, the surface area of substrate is closely associated with the total number of adsorbed hydrocarbon functional groups that considerably influences the chemical growth rate of diamond coating.…”
Section: Introductionmentioning
confidence: 99%
“…It is well known that the mixture of carbon source and hydrogen gas is the main reactant gas of CVD diamond coating deposition [8,9]. Hence, the substrate must possess the hydrocarbon adsorption capability, which can be regarded as the first step of generating diamond grains [10]. Meanwhile, the surface area of substrate is closely associated with the total number of adsorbed hydrocarbon functional groups that considerably influences the chemical growth rate of diamond coating.…”
Section: Introductionmentioning
confidence: 99%