Enhancement of ArF immersion scanner system for advanced device node manufacturing

Hikida, Yujiro; Hayakawa, Akira; Teshima, Yoshihiro; Dosho, Tomonori; Kasai, Noriaki; Yoda, Yasushi; Masaki, Kazuo; Shibazaki, Yuichi

doi:10.1117/12.2297302

Cited by 2 publications

(1 citation statement)

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“…In Immersion lithography, the immersion liquid plays a crucial role on the pattern transfer from the projection lens to the silicon wafer [1][2][3]. In order to acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably [4][5][6].…”

Section: Introductionmentioning

confidence: 99%

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Zheng¹,

Chen²

2019

dtcse

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The immersion liquid plays a crucial role on the pattern transfer from the projecting lens to the silicon wafer in immersion lithography. To acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably. In this paper, a mathematical model is constructed for the immersion fluid field and effects of various structural parameters on the flowing of the immersion liquid are investigated. As a result, optimal structural parameters of the immersion field are acquired to ensure the fast and stable flowing of the immersion liquid in the end.

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Section: Introductionmentioning

confidence: 99%

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Zheng¹,

Chen²

2019

dtcse

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Sub-pixel position estimation algorithm based on Gaussian fitting and sampling theorem interpolation for wafer alignment

Pan

Wang

et al. 2021

Appl. Opt.

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Wafer alignment is the core technique of lithographic tools. Image-processing-based wafer alignment techniques are commonly used in lithographic tools. An alignment algorithm is used to analyze the alignment mark image for obtaining the mark position. The accuracy and speed of the alignment algorithm are very important for guaranteeing the overlay and throughput of lithographic tools. The most commonly used algorithm in image-processing-based alignment techniques is the self-correlation method. This method has a high accuracy, but the calculation is complex, and the calculation speed is slow. In this paper, we propose a sub-pixel position estimation algorithm based on Gaussian fitting and sampling theorem interpolation. The algorithm first reconstructs the alignment signal by sampling theorem interpolation and then obtains the sub-pixel position of the mark by Gaussian fitting. The accuracy and robustness of the algorithm are verified by testing the simulated marks and experimentally captured marks. The repeat accuracy can reach 1/100 pixels, which is in the same level with the self-correlation method. The calculation speed is highly improved compared with the self-correlation method, which needs only about 1/3 of even short calculation time.

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Enhancement of ArF immersion scanner system for advanced device node manufacturing

Cited by 2 publications

References 0 publications

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Sub-pixel position estimation algorithm based on Gaussian fitting and sampling theorem interpolation for wafer alignment

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