Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Abstract

The immersion liquid plays a crucial role on the pattern transfer from the projecting lens to the silicon wafer in immersion lithography. To acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably. In this paper, a mathematical model is constructed for the immersion fluid field and effects of various structural parameters on the flowing of the immersion liquid are investigated. As a result, optimal structural parameters of the immersion field are acquired to ensure the fast and stable flowing of the immersion liquid in the end.