2016
DOI: 10.1007/s11082-016-0495-0
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Enhanced photon lifetime in silicon nanowire arrays and increased efficiency of optical processes in them

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Cited by 14 publications
(2 citation statements)
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“…[ 13 ] A many‐fold increase in the line intensity of SiNWs compared with that of c‐Si substrate can be explained by a partial localization of the excitation light in SiNW arrays. [ 14 ] Both the intensity and line shape of SiNWs do not change after TA that evidences the same morphology of the nanowires in agreement with the SEM data (Figure 1b,c and Figures S1 and S2). A weak background of the Raman spectra in Figure 2a can be related to the photoluminescence (PL) of small Si nanocrystals located on the walls of SiNWs.…”
Section: Resultssupporting
confidence: 87%
“…[ 13 ] A many‐fold increase in the line intensity of SiNWs compared with that of c‐Si substrate can be explained by a partial localization of the excitation light in SiNW arrays. [ 14 ] Both the intensity and line shape of SiNWs do not change after TA that evidences the same morphology of the nanowires in agreement with the SEM data (Figure 1b,c and Figures S1 and S2). A weak background of the Raman spectra in Figure 2a can be related to the photoluminescence (PL) of small Si nanocrystals located on the walls of SiNWs.…”
Section: Resultssupporting
confidence: 87%
“…SiNW arrays fabricated via a metal-assisted chemical etching technique [46] contain SiNWs of about 100 nm in diameter and up to 100 µm in length which demonstrate strong scattering and high absorption of visible and near-infrared light [47,48]. Ablation threshold of SiNWs is up to eight times lower than in crystalline silicon [34,35], which increases product yield and reduces the estimated production cost.…”
Section: Introductionmentioning
confidence: 99%