2017
DOI: 10.1021/acsomega.6b00294
|View full text |Cite
|
Sign up to set email alerts
|

Enhanced Photoluminescence of Solution-Exfoliated Transition Metal Dichalcogenides by Laser Etching

Abstract: Using a conventional Raman experimental apparatus, we demonstrate that the photoluminescent (PL) yield from ultrasonication-exfoliated transition metal dichalcogenides (TMDs) (MoS 2 and WS 2 ) can be increased by up to 8-fold by means of a laser etching procedure. This laser etching process allows us to controllably pattern and reduce the number of layers of the solution-exfoliated material, overcoming the key drawback to solvent-based exfoliation of two-dimensiona… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
13
0

Year Published

2018
2018
2024
2024

Publication Types

Select...
9

Relationship

1
8

Authors

Journals

citations
Cited by 15 publications
(13 citation statements)
references
References 53 publications
0
13
0
Order By: Relevance
“…Moreover, all peaks become narrower after the second annealing step. The most dramatic change was with the peak labelled LA (M)-TA(M) 31 where its FWHM was reduced from 63.4 cm −1 in the first annealing step to 24.4 cm −1 in the second annealing step for SiO 2 /Si and from 51 cm −1 to 28 cm −1 for sapphire. Additional peaks that correspond to 2LA (K) mode 32 are also apparent at 385.2 cm −1 and 387.7 cm −1 for SiO 2 /Si and sapphire respectively, which did not exist after the first annealing step.…”
Section: Figurementioning
confidence: 99%
“…Moreover, all peaks become narrower after the second annealing step. The most dramatic change was with the peak labelled LA (M)-TA(M) 31 where its FWHM was reduced from 63.4 cm −1 in the first annealing step to 24.4 cm −1 in the second annealing step for SiO 2 /Si and from 51 cm −1 to 28 cm −1 for sapphire. Additional peaks that correspond to 2LA (K) mode 32 are also apparent at 385.2 cm −1 and 387.7 cm −1 for SiO 2 /Si and sapphire respectively, which did not exist after the first annealing step.…”
Section: Figurementioning
confidence: 99%
“…Focused lasers have been used to etch MoS 2 and WS 2 in a controllable manner with the likely mechanism being thermal sublimation or oxidation/evaporation in ambient conditions. [133][134][135] This technique can be used to etch features such as nanoribbons into MoS 2 . 133 Voids formed from the etching process also exhibited hexagonal geometry, thus revealing the orientation of the lattice (Fig.…”
Section: Emerging Nanopattering and Lithographic Techniques Lateral Hmentioning
confidence: 99%
“…It is also important to note that exploring the parameter space of direct laser synthesis will allow thickness control of the MoS 2 or WS 2 via sublimation of the topmost layers 23 , 26 ; improve the crystallinity of the TMDCs 32 , 33 ; and affect the amount of the oxide content in the structures 37 , 41 , 42 .…”
Section: Resultsmentioning
confidence: 99%