2014
DOI: 10.1039/c4ra10409a
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Enhanced photoelectroctatlytic performance of etched 3C–SiC thin film for water splitting under visible light

Abstract: A low temperature alternating supply epitaxy grown p-type 3C–SiC thin film is further etched to enhance the photoelectrocatalytic performance.

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Cited by 10 publications
(7 citation statements)
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“…Hierarchical SiC nanowires (Fig. S2) were employed to support Pd nanoparticles, because the hierarchical structure promotes an increase in light absorption and specific surface area, as well as a reduction in the recombination rate of photoelectron and holes, thus improving the photocatalytic activity [57,58]. The transmission electron microscopy (TEM) images of Pd/SiC (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Hierarchical SiC nanowires (Fig. S2) were employed to support Pd nanoparticles, because the hierarchical structure promotes an increase in light absorption and specific surface area, as well as a reduction in the recombination rate of photoelectron and holes, thus improving the photocatalytic activity [57,58]. The transmission electron microscopy (TEM) images of Pd/SiC (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…In the past several decades, photoelectrochemical (PEC) hydrogen evolution from water using semiconductors as photocatalyst has attracted extensive attention because it is a promising clean and renewable energy technology [1][2][3][4][5]. Among the various semiconductors, p-type cuprous oxide (Cu2O) is one of the most promising visible light PEC materials for water splitting [6][7][8].…”
Section: Introductionmentioning
confidence: 99%
“…Aluminum was employed as the dopant in the in situ doping process where trimethylaluminum [(CH 3 ) 3 Al, TMAl] was the precursor to form p-type 3C-SiC. The properties of the grown single crystalline 3C-SiC films were characterized and reported elsewhere 26,27 . The X-ray diffraction (XRD) measurement indicated that the SiC film is epitaxially grown on Si (100) substrate, Fig.…”
mentioning
confidence: 99%
“…The properties of the grown single crystalline 3C-SiC lms were characterized and reported elsewhere. 26,27 The X-ray diffraction (XRD) measurement indicated that the SiC lm is epitaxially grown on Si (100) substrate, Fig. 1(a).…”
mentioning
confidence: 99%