Enhanced deposition rates in plasma sputter deposition

Thomann, Anne Lise; Charles, Christine; Brault, Pascal; Laure, C.; Boswell, Rod

doi:10.1088/0963-0252/7/3/002

Cited by 18 publications

(24 citation statements)

References 19 publications

(32 reference statements)

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“…The fact that platinum diffuses deeper at low pressure results from a higher kinetic energy of the sputtered platinum atoms and from ion bombardment occurring during deposition as previously reported on flat surfaces [27][28][29][30].…”

Section: The Pt/c Layerssupporting

confidence: 55%

Carbon/platinum nanotextured films produced by plasma sputtering

Rabat

Andreazza

Brault

et al. 2009

Carbon

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Platinum loaded carbon layers were synthesized by a two-step plasma sputtering process. 200 nm thick columnar (columns with an average diameter of 20 nm) carbon films having a large open porosity were formed in the first step. Using the same plasma system, the films were subsequently loaded with platinum. SEM, TEM and Rutherford backscattering spectrometry analysis show that platinum diffuses into the carbon layer and forms nano-sized particles (mean diameter ca. 3 nm) along and around the carbon nanocolumns and down to the film/support interface. Optimized catalytic layers were formed at low plasma pressure operation (<1 Pa) and had an upper platinum loading limit of about 0.1 mg.cm -2 .

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Section: The Pt/c Layerssupporting

confidence: 55%

Carbon/platinum nanotextured films produced by plasma sputtering

Rabat

Andreazza

Brault

et al. 2009

Carbon

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“…This is because the ion density increases when the plasma gets more confined by collisions. This point is reported in [26] for instance.…”

Section: Energy Transfer During Dsp Versus Experimental Parametersmentioning

confidence: 58%

Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

Bedra¹,

Thomann²,

Semmar³

et al. 2010

J. Phys. D: Appl. Phys.

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To cite this version:L Bedra, a L Thomann, N Semmar, R Dussart, J Mathias. Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals. AbstractThis work reports results obtained from heat flux measurements performed during the deposition of metallic thin films by low-pressure plasma sputtering. It introduces a sensitive diagnostic, which allows to perform such measurements directly during the process and to follow in real-time mechanisms involved in plasma/surface interaction. Although quantitative results are provided and discussed, the main scope of this article is a qualitative study of the sputter-deposition process via the energy flux transfers. The diagnostic developed for energy flux measurements is presented and the versatility of the experimental apparatus is described.Results on the study of the deposition of Pt (and Fe) thin films demonstrate a good reproducibility of the measurements and the ability to separate the energetic contributions of the main plasma (∼ 300 mW/cm 2 ) from the deposition process ones (2 to 23 mW/cm 2 ). The influence of gas pressure, plasma power and target bias voltage, on the energy transferred to the silicon substrate is also studied.

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“…The fact that the platinum diffuses deeper at low pressure comes from the higher kinetic energy of sputtered platinum atoms. Moreover, simultaneous ion bombardment occurring during deposition is more efficient at low pressure and improves Pt diffusion into porous carbon [15][16][17][18]. Thus, for several alternated deposition steps, the carbon layers must be thick enough for the columnar structure to be formed and the platinum should be deposited at low pressure and in sufficiently little quantities to expect the appropriate open porosity, so that such multilayered porous thin film will be suitable as a fuel cell electrode.…”

Section: Resultsmentioning

confidence: 99%

Plasma Sputtering Deposition of PEMFC Porous Carbon Platinum Electrodes

Rabat

Brault

2008

Fuel Cells

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A novel method is proposed to fabricate the active catalytic layers of proton exchange membrane fuel cells (PEMFC). A plasma sputtering technique is used to deposit a porous columnar carbon film (column diameter of 20 nm) followed by the catalyst (platinum) deposition directly on the proton‐conducting membrane. The study of Pt diffusion shows that the optimised catalysed layers correspond to low plasma pressure operation (0.5 Pa) below a platinum loading limit of about 90 μg cm–2. The initial carbon porosity is then maintained and Pt nanoparticles are present in all parts of the carbon layer. A membrane electrode assembly (MEA) is then achieved by alternate depositions of carbon and platinum onto both sides of the membrane. The results show the importance of the porous carbon structure. A significant increase in the catalyst efficiency is observed compared to a commercial fuel cell when measuring open circuit voltage.

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Enhanced deposition rates in plasma sputter deposition

Cited by 18 publications

References 19 publications

Carbon/platinum nanotextured films produced by plasma sputtering

Carbon/platinum nanotextured films produced by plasma sputtering

Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

Plasma Sputtering Deposition of PEMFC Porous Carbon Platinum Electrodes

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