Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

Bedra, Larbi; Thomann, Anne-Lise; Semmar, Nadjib; Dussart, Rémi; Mathias, Jacky

doi:10.1088/0022-3727/43/6/065202

Cited by 15 publications

(10 citation statements)

References 25 publications

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“…As it was previously demonstrated, HFM measurements allow separating contributions exhibiting different time scales [7]. Figure 2a shows a typical HFM signal which represents the evolution of the energy flux with respect to time in the case of a balanced pDCMS discharge.…”

Section: Ir Contribution and Target Temperaturementioning

confidence: 91%

“…An energy flux diagnostic tool specially designed for low-pressure plasma processes was used [4]. The sensitivity and the accuracy of this tool were previously demonstrated in several plasma systems [4][5][6][7]. It has been shown that, thanks to the fast time response of the sensor (thermopile), the energetic contribution of the plasma can be separated from thermal processes such as IR emission from the heated target.…”

Section: Introductionmentioning

confidence: 99%

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IR emission from the target during plasma magnetron sputter deposition

et al. 2013

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In this article, energy flux measurements at the substrate location are reported. In particular, the energy flux related to IR radiation emanating from the titanium (10 cm in diam.) target surface is quantified during magnetron sputter deposition processes. In order to modulate the plasma-target surface interaction and the radiative energy flux thereof, the working conditions were varied systematically. The experiments were performed in balanced and unbalanced magnetic field configurations with direct current (DC), pulsed DC and high power impulse magnetron sputtering (HiPIMS) discharges. The power delivered to the plasma was varied too, typically from 100 to 800 W. Our data show that the IR contribution to the total energy flux at the substrate increases with the supplied sputter power and as the discharge is driven in a pulse regime. In the case of HiPIMS discharge generated with a balanced magnetic field, the energy flux associated to the IR radiation produced by the target becomes comparable to the energy flux originating from collisional processes (interaction of plasma particles such as ions, electron, sputtered atoms etc. with the substrate). From IR contribution, it was possible to estimate the rise of the target surface temperature during the sputtering process. Typical values found for a titanium target are in the range 210 °C to 870 °C

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Section: Ir Contribution and Target Temperaturementioning

confidence: 91%

Section: Introductionmentioning

confidence: 99%

IR emission from the target during plasma magnetron sputter deposition

et al. 2013

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“…In the present study we have performed energy flux measurements at the substrate location during reactive sputter deposition by means of an energy flux diagnostic (thermopile, 300 µs time resolution) previously used in several low pressure plasmas [23][24][25][26]. The main goal was to study the energy transfer in both deposition regimes and especially during the transitions from one to the other.…”

Section: Introductionmentioning

confidence: 99%

Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere

Thomann¹,

Cormier²,

Dolique³

et al. 2013

Thin Solid Films

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International audienceA study of the reactive sputtering of aluminum was carried out by coupling energy flux measurements at the substrate location with conventional diagnostics of the gas phase and analyses of the deposited films. The main purpose was to get some insight into the elementary mechanisms involved at the substrate surface during the film growth in the well known metal and oxide regimes and at the transitions from one to another. Measurements were carried out in front of a 10 cmAl target at a power of 400W (i.e. 5 W/cm2) and a total pressure of 0.6 Pa. The flow rate ratio (O2/O2+Ar) was varied in the range 0 to 50 %. Different kinetics and values of energy transfer, denoting different involved mechanisms, were evidenced at metal-oxide (increasing flow rate) and oxide-metal (decreasing flow rate) transitions. The metal-oxide transition was found to be a progressive process, in agreement with optical emission spectroscopy and deposit analysis, characterized by an increase of the energy flux that could be due to the oxidation of the growing metal film. On the contrary, oxide-metal transition is abrupt, and a high energy released at the beginning that could not be attributed to a chemical reaction. The possible effect of O-ions at this step was discussed

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“…The HFM is characterized by a very good time resolution which can even be increased by the ablation of the black coating (zynolithe) and the optimization of the acquisition system. It has been previously demonstrated that this fast response allows for the separation of energetic contributions depending on their kinetics [17]. Consequently, the HFM is an interesting tool to separate energetic contributions and detect low energy influxes.…”

Section: Resultsmentioning

confidence: 99%

On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

Cormier¹,

Stahl²,

Thomann³

et al. 2010

J. Phys. D: Appl. Phys.

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Two different diagnostics for the determination of the energy influx in plasma processes were used to characterize an ion beam source and an asymmetric RF discharge. The related energy fluxes were measured in dependence on the ion energy and on the RF power, respectively. The first sensor, called HFM (Heat Flux Microsensor) is a thermopile which allows for direct energy flux measurements. With the second sensor, a calorimetric probe, the energy influx has been calculated from the temporal temperature evolution preliminary registered. Although the working principle of both sensors is different, the obtained results are in good agreement. In the ion beam ( < 1,5keV)) rather high energy influxes are achieved (up to 700mW/cm²), whereas the values measured in the asymmetric RF discharge were lower than 50mW/cm² for discharge powers in the range of 10 to 100 W. The performances and limitations of both sensors are compared and discussed.

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Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

Cited by 15 publications

References 25 publications

IR emission from the target during plasma magnetron sputter deposition

IR emission from the target during plasma magnetron sputter deposition

Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere

On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

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