ENERGY-FILTERED RHEED AND REELS FOR IN SITU REAL TIME ANALYSIS DURING FILM GROWTH

Atwater, Harry A.; Ahn, Channing C.; Wong, Selmer S.; He, Gang; Yoshino, H.; Nikzad, Shouleh

doi:10.1142/s0218625x9700050x

“…While no widely used tool for in situ compositional analysis of film surfaces has emerged, several recent approaches involving x-ray fluorencence, 5 energy loss spectroscopy, 6 and under UHV conditions, Auger spectroscopy using a RHEED gun for excitation 7 have been described in the literature. The ability to determine the real-time surface composition of growing films has eluded traditional analysis techniques ͓x-ray photoelectron spectroscopy ͑XPS͒, secondary-ion-mass spectroscopy, and Auger electron spec-troscopy͔ because the high pressure in the growth chamber required for most vapor deposition processes inhibits such measurements.…”

Section: Introductionmentioning

confidence: 99%

In situx-ray photoelectron spectroscopy for thin film synthesis monitoring

Kelly

¹

,

Shek

²

,

Pianetta

³

et al. 2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inCharacterization of TiAlN thin film annealed under O 2 by in situ time of flight direct recoil spectroscopy/mass spectroscopy of recoiled ions and ex situ x-ray photoelectron spectroscopy J. Vac. Sci. Technol. A 20, 1320 (2002); 10.1116/1.1482711 X-ray photoelectron spectroscopic characterization of the adhesion behavior of chemical vapor deposited copper films J.Tungsten silicide composition analysis by Rutherford backscattering spectroscopy, Auger electron spectroscopy, and x-ray photoelectron spectroscopyWe describe an x-ray photoelectron spectroscopy spectrometer capable of determining the composition, thickness, and chemistry of thin film surfaces during growth. The instrument operates at pressures up to a few millitorr, an adequate range for many sputtering, low pressure chemical vapor deposition and thermal evaporation processes. Using a conventional x-ray source, spectra of individual elements can be rapidly accumulated in 10-30 s. To illustrate its capabilities, we present two examples of measurements made with the spectrometer. The low pressure chemical vapor deposition growth of a WO 3 film on Si in a 1 mTorr O 2 environment, and the thermal oxidation of Si in a 2ϫ10 Ϫ4 torr O 2 environment. We believe these represent the first measurements of such processes in real time by electron spectroscopy. We also describe the spectrometer construction and capabilities in some detail, contemplated improvements in its performance, and anticipated applications.

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“…The RHEED technique records the diffraction of high energy electrons that have been directed towards the surface at a glancing angle. RHEED measurements allow monitoring of the crystallinity of the growing film [52].…”

Section: Surface Analysismentioning

confidence: 99%

A Hybrid Molecular Dynamics Kinetic Monte Carlo Simulation Methodology

Zoontjens¹

0

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This thesis describes a novel hybrid computational methodology in which the Molecular Dynamics and Kinetic Monte Carlo methods are concurrently combined. This hybrid methodology has been developed to simulate phenomena which are unfeasible to treat with either Molecular Dynamics or Kinetic Monte Carlo alone, due to the wide range of time scales involved and the need for highly detailed atom dynamics. Is is shown that the hybrid methodology can reproduce the results of a larger (more atoms) all Molecular Dynamics simulation at a significant reduction in computational cost (run time) - due to the replacement of Molecular Dynamics atoms with Kinetic Monte Carlo atoms. The hybrid methodology has been successfully used to study the dynamics of epitaxial stacking fault grain boundaries. This work identified that grain boundary motion was hindered by atoms lodging in off-lattice sites, and also by overlayer islands built up by adatom deposition. It was verified that the ‘kink flip” move is a key element in the motion of grain boundaries. Methods for enhancing the hybrid methodology were researched. It was shown that by an optimal choice of damping parameter γ, wave reflections back into the Molecular Dynamics domain could be minimised. This is expected to enable the hybrid methodology to operate successfully with smaller Molecular Dynamics domains, making larger and/or longer simulation runs feasible. This research included the derivation of the dispersion relation for the discrete case with damping and net reflectivity formulas. These are believed to be new results. The hybrid model can be applied to a wide variety of MD and KMC methods. Other MD potentials such as Embedded Atom or Modified Embedded Atom could be employed. The KMC component can be developed to use a more refined lattice or an ”on the fly” KMC method could be employed. Both the MD and KMC components can be extended to handle more than one species of atom. Parallelised versions of the MD and KMC components could also be developed. Any situation where the problem can be decomposed into distinct domains of fine scale and coarse scale modelling respectively, is potentially suitable for treatment with a hybrid model of this design.

show abstract

“…The RHEED technique records the diffraction of high energy electrons that have been directed towards the surface at a glancing angle. RHEED measurements allow monitoring of the crystallinity of the growing film [52].…”

Section: Surface Analysismentioning

confidence: 99%

A Hybrid Molecular Dynamics Kinetic Monte Carlo Simulation Methodology

Zoontjens¹

0

View full text Add to dashboard Cite

This thesis describes a novel hybrid computational methodology in which the Molecular Dynamics and Kinetic Monte Carlo methods are concurrently combined. This hybrid methodology has been developed to simulate phenomena which are unfeasible to treat with either Molecular Dynamics or Kinetic Monte Carlo alone, due to the wide range of time scales involved and the need for highly detailed atom dynamics. Is is shown that the hybrid methodology can reproduce the results of a larger (more atoms) all Molecular Dynamics simulation at a significant reduction in computational cost (run time) - due to the replacement of Molecular Dynamics atoms with Kinetic Monte Carlo atoms. The hybrid methodology has been successfully used to study the dynamics of epitaxial stacking fault grain boundaries. This work identified that grain boundary motion was hindered by atoms lodging in off-lattice sites, and also by overlayer islands built up by adatom deposition. It was verified that the ‘kink flip” move is a key element in the motion of grain boundaries. Methods for enhancing the hybrid methodology were researched. It was shown that by an optimal choice of damping parameter γ, wave reflections back into the Molecular Dynamics domain could be minimised. This is expected to enable the hybrid methodology to operate successfully with smaller Molecular Dynamics domains, making larger and/or longer simulation runs feasible. This research included the derivation of the dispersion relation for the discrete case with damping and net reflectivity formulas. These are believed to be new results. The hybrid model can be applied to a wide variety of MD and KMC methods. Other MD potentials such as Embedded Atom or Modified Embedded Atom could be employed. The KMC component can be developed to use a more refined lattice or an ”on the fly” KMC method could be employed. Both the MD and KMC components can be extended to handle more than one species of atom. Parallelised versions of the MD and KMC components could also be developed. Any situation where the problem can be decomposed into distinct domains of fine scale and coarse scale modelling respectively, is potentially suitable for treatment with a hybrid model of this design.

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ENERGY-FILTERED RHEED AND REELS FOR IN SITU REAL TIME ANALYSIS DURING FILM GROWTH

Cited by 5 publications

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In situx-ray photoelectron spectroscopy for thin film synthesis monitoring

In situx-ray photoelectron spectroscopy for thin film synthesis monitoring

A Hybrid Molecular Dynamics Kinetic Monte Carlo Simulation Methodology

A Hybrid Molecular Dynamics Kinetic Monte Carlo Simulation Methodology

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