Embedding Cs₃Cu₂I₅ Scintillators into Anodic Aluminum Oxide Matrix for High‐Resolution X‐Ray Imaging

Abstract

Scintillators are widely utilized as X‐ray imaging detectors. Pixelated scintillator films with optical‐waveguide‐effect are preferred to realize high‐resolution X‐ray imaging. However, it remains a great challenge to rapidly fabricate high‐resolution pixelated scintillator film. Herein, a new strategy is developed to solve the problem by embedding metal halide scintillators into an anodic aluminum oxide (AAO) via a facile hot‐pressing method. Cs3Cu2I5 is selected as the prototype to fabricate pixelated scintillator films with targeted thickness, denoted as Cs3Cu2I5−AAO. The light confinement effect provided by AAO is validated by finite‐difference time‐domain simulations. In particular, the as‐prepared Cs3Cu2I5−AAO film demonstrates higher spatial resolution (10.4 lp mm−1 at modulation transfer function = 0.2), higher UV and X‐ray imaging performances compared to the homogeneous counterpart and commercialized terbium‐doped gadolinium oxysulfide. These results can inspire further research on the design of nanostructured metal halide perovskites for high‐resolution X‐ray imaging.

Zero‐Dimensional Luminescent Metal Halide Hybrids Enabling Bulk Transparent Medium as Large‐Area X‐Ray Scintillators

“…As a result, the image resolution for (ETP) 2 MnBr 4 transparent medium scintillator was 13.4 lp mm −1 , which was even superior to most of the commercial and metal halide scintillators, such as 7.5 lp mm -1 for CsCu 2 I 3 and 9.8 lp mm -1 for CsPbBr 3 (Figure 4g). [11,13,14,[35][36][37] The high spatial resolution was largely due to the excellent transmittance of (ETP) 2 MnBr 4 transparent medium and the reduction of light scattering. Combined with the outstanding X-ray imaging performance and a fast meltquenching synthetic method, the (ETP) 2 MnBr 4 transparent scintillator with tailored and flexible shape and size will be expected to have great potential for the medical or industrial X-ray imaging application.…”

Low‐Temperature Melt Processing Monolithic Integration of Organic Manganese (II) Bromide Wafers with Pixelated Substrate for High Sensitivity X‐Ray Imaging

“…[32][33][34] Most recently, Pan et al prepared thick quasi-single crystal CsPbBr 3 films using melt processing (600 °C), [33] and Zhao et al prepared pixelated scintillator films by embedding the molten metal halide (390 °C) scintillator Cs 3 Cu 2 I 5 in anodized aluminum oxide (AAO). [35] However, the main hinderance to integration is the high processing temperature. The pixelated electrode of TFT or CMOS substrate will be easily destroyed during the integration process (>200 °C).…”

Intense broadband radioluminescence from an Mn2+-doped aluminoborate glass scintillator

“…[10][11][12]14,15 Hence, numerous efforts have been devoted to the search of alternative scintillating materials, ranging from polymers and glass to inorganic poly-crystals and their composites. [16][17][18][19][20][21][22] Furthermore, the discovery of scintillators has progressed to provide more alternative scintillating materials for radioluminescence yield, detection efficiency, and fast response. 5,6 Novel scintillating materials are still in urgent demand, especially those with lowcost, large size, easy preparation and low scattering effect.…”