2020
DOI: 10.1002/adma.202001534
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Embedded Metal Oxide Plasmonics Using Local Plasma Oxidation of AZO for Planar Metasurfaces

Abstract: New methods for achieving high‐quality conducting oxide metasurfaces are of great importance for a range of emerging applications from infrared thermal control coatings to epsilon‐near‐zero nonlinear optics. This work demonstrates the viability of plasma patterning as a technique to selectively and locally modulate the carrier density in planar Al‐doped ZnO (AZO) metasurfaces without any associated topographical surface profile. This technique stands in strong contrast to conventional physical patterning which… Show more

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Cited by 21 publications
(18 citation statements)
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“…For the metasurface, we choose AZO with a carrier density of 6 × 10 20 cm −3 , consistent with our previous works and the highest carrier density achieved in our experimental system. [ 63 ] The metasurface (Figure 1b) is designed as a square array of AZO features with varying sizes and gap spacing between adjacent structures. Figure 1c shows the simulated optical response of the complete design for various feature sizes from 0.94 to 1.74 µm and a fixed gap size of 0.2 µm.…”
Section: Resultsmentioning
confidence: 99%
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“…For the metasurface, we choose AZO with a carrier density of 6 × 10 20 cm −3 , consistent with our previous works and the highest carrier density achieved in our experimental system. [ 63 ] The metasurface (Figure 1b) is designed as a square array of AZO features with varying sizes and gap spacing between adjacent structures. Figure 1c shows the simulated optical response of the complete design for various feature sizes from 0.94 to 1.74 µm and a fixed gap size of 0.2 µm.…”
Section: Resultsmentioning
confidence: 99%
“…The Al 2 O 3 was grown at 175 °C using trimethylaluminum (TMA) and water. The Al:ZnO was grown at 250 °C using TMA and diethyl zinc (DEZ) and water with a TMA:DEZ cycle ratio of 4% (detailed in previous works) [18,63] and carrier concentration was measured to be 6 × 10 20 cm −3 . The AZO was subsequently patterned using Nikon NSR-S204B 248 nm DUV system with KrF M91Y photoresist (680 nm thickness after development).…”
Section: Methodsmentioning
confidence: 99%
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“…[ 140,141 ] To date, many types of plasma systems have been designed such as, e.g., DC discharge‐based platforms, [ 142–144 ] microwave systems, [ 145–147 ] inductively coupled plasma (ICP), [ 148–150 ] and capacitively coupled plasma (CCP) [ 151,152 ] systems, radio‐frequency (RF) and magnetrons, [ 153–156 ] and many others. [ 157–160 ]…”
Section: Plasma‐based Methods For Biowaste‐nanomaterials Conversionmentioning
confidence: 99%
“…By manipulating the nanoarchitecture, a wide variety of plasmonic responses have been demonstrated. Such architectures were able to advance applications in nanophotonics, solar energy harvesting, , biosensing, , optical encoding, photocatalysis, , and waveguiding, as well as the most impactful area of cancer treatment. , …”
mentioning
confidence: 99%