2005
DOI: 10.1016/j.jasms.2004.09.022
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Elemental distribution in fluorinated amorphous carbon thin films

Abstract: Focused ion beam-secondary ion mass spectrometry (FIB-SIMS) with 20 nm spatial resolution has been used to analyze amorphous fluorinated carbon thin films, deposited by plasma assisted chemical vapor deposition (PACVD), at micro-to nano-scale. Mass spectra and ion imaging of film surface were acquired and the presence and distribution of contaminants were investigated. Surface images show the secondary ion distribution for F Ϫ , CH Ϫ , CF Ϫ . A change in size and topology of fluorine-rich areas is correlated w… Show more

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Cited by 9 publications
(11 citation statements)
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“…Fluorine, which has a higher electron affinity than hydrogen, can then be added to the dangling bonds created by hydrogen abstraction. 27 Based on extended Huckel molecular orbital calculations, the attachment of fluorine atoms to free radical sites does not cause significant disturbance of the adjacent CAC r bond, 28 and thus, it gives rise to the saturated bonding configuration.…”
Section: Resultsmentioning
confidence: 99%
“…Fluorine, which has a higher electron affinity than hydrogen, can then be added to the dangling bonds created by hydrogen abstraction. 27 Based on extended Huckel molecular orbital calculations, the attachment of fluorine atoms to free radical sites does not cause significant disturbance of the adjacent CAC r bond, 28 and thus, it gives rise to the saturated bonding configuration.…”
Section: Resultsmentioning
confidence: 99%
“…According to the different energy conditions, it could be clas-sied as follows. Lamperti et al [56][57][58] comprehensively studied the structure and mechanical properties versus CF 4 content and bias voltage variation separately. When the energy of C + cations reaches 100 eV, incident ions are trapped in the subsurface layers as interstitials, thus favoring the increase of inner stress and the formation of metastable phases.…”
Section: Deposition Mechanismmentioning
confidence: 99%
“…Studies by mass spectrometry of the species produced during deposition of magnetron sputtered CF n films are also available in literature . Meanwhile, plasma synthesis of fluorinated DLC films and other fluorinated carbon films by using CF 4 as fluorine precursor has been the subject of numerous works, although in the majority of these investigations the emphasis was put on the materials properties rather than on the relationships with the plasma characteristics. Similar works, but using c ‐C 4 F 8 and other fluorinated hydrocarbons as fluorine precursors, can be also found in the recent literature on fluorinated carbon films …”
Section: Introductionmentioning
confidence: 99%