Elektronenmikroskopische Sichtbarmachung von ≤ 10 A großen Fremdstoffeinschlüssen in elektrolytisch abgeschiedenen Nickelschichte mittels Phasenkontrast durch Defokussieren

The first stage of eleetromonocrystallization, the growth of single-crystal electrodeposits, in a number of instances is the developmen~ of three-dimensional, epitaxial crystallRes (TEC). The absence or presence of TEC as well as their morphology is determined by the codeposited foreign species, either intentionally added or apparently resulting from a high pH in the solution adjacent to the cathode. When a complete deposit layer has formed, strains result from the difference between the lattice dimensions of the deposit and substrate as well as from the coalescence of TEC. Surface undulations are also related to the joining of TEC. Dislocations of the misfit type develop at certain deposit thicknesses; their spacing and straightness again are related to the presence of foreign substances. The coalescence of TEC and possibly of atom layers too thin to be visible also results in dislocation and twin formation.* Electrochemical Society Active Member. ABSTRACTThe PSMD imaging system employs aqueous SnC12 sensitizer solutions to generate electroless metal photopatterns on dielectric substrates. We have measured how aging in several typical sensitizer solutions affects their ability to generate electroless copper photopatterns on polyimide H film (DuPont Kapton@). Specimens, consecutively sensitized as the solution aged, have been characterized with respect to (i) tin deposition (by x-ray fluorescence), (ii) catalytic activity for metalization (by optical density determination of the deposited electroless copper), and (iii) imageability (by image contrast measurements of the developed copper patterns). The system Jmageability is found highly dependent on the sensitizer solution age, while the capability for blanket metalization was relatively unaffected.Photoselective metal deposition (PSMD), a process for metal patterning dielectric substrates by uv light exposure and electroless (chemical) plating, has been the subject of several recent papers (1-4). These have * Electrochemical Society Active Member.) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.122.253.212 Downloaded on 2015-07-24 to IP

Section: Methodsmentioning

confidence: 99%

Initial Stages of Electromonocrystallization of Nickel on Copper-Film Substrates

Nakahara

Weil

1973

“…Albert et al (3) subsequently made a more systematic study on the origin of the observed molecule images in TEM. They convincingly demonstrated using O-phenanthroline as an addition agent that incorporated molecule images in nickel films originate from phase contrast and thus the imaging can be achieved by defocusing.…”

Section: Direct Tem Observations Of Inclusions In Electrodeposited Fi...mentioning

confidence: 99%

Direct Observations of Inclusions in Electrodeposited Films by Transmission Electron Microscopy

Nakahara¹

1982

A transmission electron microscope is used to detect the presence of small (∼10Å) gaseous and organic inclusions in electrodeposited films. These inclusions are made visible using the defocus contrast technique and their locations and spatial distributions are determined by stereomicroscopy. In this paper, we first describe the historical development in the direct observations, then present optical principles of the defocus imaging technique in detail, and finally give several examples of various types of inclusions from our recent microstructural studies on electrodeposited Au, Cu, and Ni films.

“…These regions were found to lift the oxide, creating bumps in it which could be detected with either ellipsometry or scanning electron microscopy (SEM). A detailed ellipsometric investigation (1) showed that the onset of the bumps occurs at shorter oxidation times as either the oxidation temperature or ambient HC1 content is raised, and significantly, the onset was found to correlate well with the threshold in sodium passivation which has been widely observed (3,4). This correlation appears to indicate that the additional phase is responsible for sodium passivation.…”

Section: Applicationsmentioning

confidence: 99%

“…Albert et al (3) subsequently demonstrated, using several organic additives in nickel electrodeposits, that the observed TEM images of organic molecules (_~10A) included in the deposits originate primarily from please contrast and could be obtained by defocusing. It was also shown using an optical analog that these organic inclusions with molecular dimension are effectively phase objects as they become visible only by defocusing.…”

mentioning

confidence: 99%

Stereomicroscopic Method for Studying the Incorporation of Organic Molecules in Electrodeposited Films

Nakahara¹

1979

A method for studying the spatial distribution of organic molecules incorporated into electrodeposited films was developed using a transmission electron microscope. In this method, the images of small organic molecules included in the filma were taken stereoscopically using the aemcus contrast technique. From an analysis of stereo-pairs taken by this technique, it is possible to obtain a probable mechanism, whereby organic molecules are adsorbed and, subsequently, incorporated into an electrodeposit. This technique is demonstrated using examples from electrodeposited nickel films containing organic inclusions. ABSTRACTThe interrelationship which exists between sodium passivation and phase separation in silicon oxides thermally grown in HC1/O2 ambients was investigated using the capacitance-voltage bias temperature stress technique in conjunction with transmission electron microscopy. Oxides were grown in 0, * Electrochemical Society Student Member. ** Electrochemical Society Active Member.