2013
DOI: 10.1002/admi.201300001
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Electrostatic Modulation of LaAlO3/SrTiO3 Interface Transport in an Electric Double‐Layer Transistor

Abstract: The correlated charge, spin, orbital, and lattice degrees of freedom in transition metal oxides make them an attractive platform to explore rich physics and potential applications. [ 1,2 ] Oxide interfaces offer even more exciting opportunities due to the emerging effects such as broken inversion symmetry, interfacial exchange interaction, and spatial confi nement. [ 3,4 ] Heterostructures composed by non-magnetic band insulators LaAlO 3 (LAO) and SrTiO 3 (STO) have attracted much attention recently, and the u… Show more

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Cited by 81 publications
(97 citation statements)
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References 78 publications
(125 reference statements)
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“…As shown by the solid line in Fig. 3(c), the resistance upturn can be well reproduced by the standard formula [28][29][30] …”
Section: Resultsmentioning
confidence: 60%
“…As shown by the solid line in Fig. 3(c), the resistance upturn can be well reproduced by the standard formula [28][29][30] …”
Section: Resultsmentioning
confidence: 60%
“…3(a), the other dominant feature in transport is the pronounced upturn of the sheet resistances at lower temperature. Previous work on titanate heterojunctions has attributed such an upturn to the Kondo effect [12,[63][64][65][66], after carefully ruling out the contributions from weak-localization [67] and electronelectron interactions [68]. One of the key features of the Kondo effect that immediately differentiates it from weak-localization and electron-electron interactions is the universal scaling behavior [see Fig.…”
Section: +mentioning
confidence: 99%
“…[25] XPS depth profiling in our previous work. [22] Compared with the electrostatic manipulation based on the capacitance of EDL, [26] the change of x in our system is rather large as the variation of oxygen vacancies is sensitive to the external electric field. We now address the question how the orbital occupancy varies under the electric field.…”
Section: Introductionmentioning
confidence: 99%