2001
DOI: 10.1088/0957-4484/12/4/321
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Electrostatic force microscopy: principles and some applications to semiconductors

Abstract: The current state of the art of electrostatic force microscopy (EFM) is presented. The principles of EFM operation and the interpretation of the obtained local voltage and capacitance data are discussed. In order to show the capabilities of the EFM method, typical results for semiconducting nanostructures and lasers are presented and discussed. Improvements to EFM and complementary electrical methods using scanning microscopy demonstrate the continuing interest in electrical probing at the nanoscale range.

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Cited by 267 publications
(222 citation statements)
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References 45 publications
(56 reference statements)
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“…Non-contact scanning probe microscopy (SPM), such as electrostatic force microscopy (EFM), 9 dielectric force microscopy (DFM), 10 and Kelvin probe force microscopy (KPFM), 11,12 have been extensively applied to characterize local electronic properties of diverse nanomaterials. [10][11][12][13][14][15][16][17] In a non-contact mode, the probe is lifted at a constant height above the surface of interest, where long-range forces are detected.…”
mentioning
confidence: 99%
“…Non-contact scanning probe microscopy (SPM), such as electrostatic force microscopy (EFM), 9 dielectric force microscopy (DFM), 10 and Kelvin probe force microscopy (KPFM), 11,12 have been extensively applied to characterize local electronic properties of diverse nanomaterials. [10][11][12][13][14][15][16][17] In a non-contact mode, the probe is lifted at a constant height above the surface of interest, where long-range forces are detected.…”
mentioning
confidence: 99%
“…KPFM has been particularly useful for characterizing materials and devices ranging from metals, 1 semiconductors, 8,9 and ferroelectrics, 10,11 to self-assembled monolayers, 12 polymers, 13 and biomolecules. 14,15 The continued success of KPFM necessitates both the advancement of the technique in terms of accuracy and resolution 16,17 across all imaging environments, 18,19 as well as improved capabilities to distinguish and correlate different electronic parameters (i.e., dielectric properties, [20][21][22][23] dissipation 24,25 ) beyond that currently attainable with conventional KPFM.…”
Section: Band Excitation Kelvin Probe Force Microscopy Utilizing Photmentioning
confidence: 99%
“…For comparison with these modes, we also discuss a simple tip-bias experiment where a DC voltage is applied to a cantilever without an actuation electrode, as might be typical in piezoresponse force microscopy (PFM), 18 electrostatic force microscopy (EFM), 19 or kelvin probe force microscopy (KPFM). 20 In this case, it is well known that the force on the tip (F t s ) depends on the tip-sample capacitance (C t s ) gradient and may be modeled as F t s = 1 2 ∂C t s ∂z V t s 2 ; 21 here, z is the tip displacement (with the z-axis directed along the normal to the back of the cantilever), V t s is the potential difference between the tip and the sample, and we have taken V t s to include any applied tip bias and the contact potential difference between the tip and sample.…”
Section: Displacement Control In Common and Differential Modesmentioning
confidence: 99%