2004
DOI: 10.1016/j.matlet.2003.09.024
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Electrophoretic deposition of hydroxyapatite submicron particles at high voltages

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Cited by 82 publications
(66 citation statements)
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“…Homogeneous and crack-free coatings of submicron particles were also obtained in acetone suspensions applying 400-1000 V for 5 s. Many investigations have been conducted to analyse the influence of the electric field on deposition yield and microstructure of HA films obtained by EPD. The use of high voltages has the advantages of faster deposition rates, shorter deposition times and higher deposit thicknesses (Zhitomirsky & Gal-Or 1997;Mondragón-Cortez & Vargas-Gutiérrez 2004). The investigation of HA powders with a wide particle-size distribution showed preferred deposition of smaller particles at lower voltages (Zhitomirsky & Gal-Or 1997).…”
Section: Epd Of Hamentioning
confidence: 99%
“…Homogeneous and crack-free coatings of submicron particles were also obtained in acetone suspensions applying 400-1000 V for 5 s. Many investigations have been conducted to analyse the influence of the electric field on deposition yield and microstructure of HA films obtained by EPD. The use of high voltages has the advantages of faster deposition rates, shorter deposition times and higher deposit thicknesses (Zhitomirsky & Gal-Or 1997;Mondragón-Cortez & Vargas-Gutiérrez 2004). The investigation of HA powders with a wide particle-size distribution showed preferred deposition of smaller particles at lower voltages (Zhitomirsky & Gal-Or 1997).…”
Section: Epd Of Hamentioning
confidence: 99%
“…Under low voltages (<20 V), small HA particles are deposited 29) . Application of higher voltages (>200 V) for periods longer than 10 seconds is reported to deposit bigger HA particles 30) . Increasing the electric field resulted in increased rate of deposition, but the deposited particles had shorter time to rearrange and therefore these coatings had a more porous microstructure 30) .…”
Section: Introductionmentioning
confidence: 99%
“…Application of higher voltages (>200 V) for periods longer than 10 seconds is reported to deposit bigger HA particles 30) . Increasing the electric field resulted in increased rate of deposition, but the deposited particles had shorter time to rearrange and therefore these coatings had a more porous microstructure 30) . Previously, we reported that HA coatings prepared at dynamic voltages consisted of particles with continuous gradient, and that the morphology was distinctly different from that prepared at a constant voltage 19) .…”
Section: Introductionmentioning
confidence: 99%
“…In order to obtain dense, crack-free, well-adherent and low-temperature sinterable coatings, many efforts have been made in previous works [7,14,[17][18][19][20][21] . To obtain perfect coatings, stable suspension is required during the EPD process.…”
Section: Introductionmentioning
confidence: 99%