Electrophoretic deposition for coatings and free standing objects

Biest, Omer Van der; Put, Stijn; Anné, Guy; Zhang, Fei

doi:10.1023/b:jmsc.0000012905.62256.39

Cited by 47 publications

(33 citation statements)

References 8 publications

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“…The physical foundation for neglecting this factor in the case of PC solutions is developed below, however we first note that, with this choice, the agreement between predicted behavior and real measurements was quite good (compare solid lines and data points in Figure 4b). A possible explanation to this surprisingly simple model was proposed by Van der Biest et al, 50 who described various resistances encountered during EPD in terms of an equivalent electric circuit generated by different contributions. When a deposit is growing from particles suspended in a colloidal suspension, the overall resistance can be depicted dividing the system in two regions, suspension and deposit, ideally connected in series.…”

Section: Resultsmentioning

confidence: 99%

Electrophoretic Deposition of Two-Dimensional Titanium Carbide (MXene) Thick Films

Collini

Kota

Dillon

et al. 2017

J. Electrochem. Soc.

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Herein, we demonstrate the fabrication of Ti 3 C 2 T x MXene films using electrophoretic deposition (EPD). A systematic study under constant voltage conditions from aqueous and propylene carbonate-based suspensions was performed to investigate the effects of the EPD process parameters on film morphology, flake orientation, and functional properties. From measured suspension properties, the kinetics of deposition from both suspension media were successfully described by the well-established Sarkar model of EPD. Remarkably, EPD-processed films have electrical conductivities of 7400 S/cm, on par with the highest values reported in the literature for Ti 3 C 2 T x MXene. When employed as electrochemical capacitor electrodes in 1 M H 2 SO 4 , the capacitances were comparable to literature values. Given the process scalability and the morphological control that is possible, these results bode well for EPD as a fast, high-throughput method for making MXene films. Electrophoretic deposition (EPD) is a process wherein an electric field is applied to a stable colloidal suspension in between two electrodes.1 As a consequence, two distinct processes occur, as shown in Figure 1a: (1) charged particles in the colloid move toward the electrode of opposite polarity to that of the particles' surface charge (electrophoresis) and, (2) a solid deposit is formed by coagulation at the suspension-electrode interface (deposition). This technique is well-studied and successfully implemented for high-throughput production of dense, void-free ceramic structures ranging from thin coatings to bulk layers several centimeters thick.2 Because of the flexibility and scalability of the deposition apparatus (e.g. power sources and size/shape of deposition electrodes and cell), fast deposition rates, and excellent microstructural control compared to other processing methods, EPD has been used for commercial-scale production of various engineering and traditional ceramics. [2][3][4] In recent years, EPD has also become a versatile technique for making monolithic films and nanocomposites of two-dimensional (2D) materials -such as graphene, transition metal dichalcogenides, and layered transition metal oxides 5-10 -due to advances in colloidal processing. Recently, we discovered a new family of two-dimensional (2D) early transition metal carbides and nitrides, that we labeled MXene, because they are derived from the MAX phases and share properties similar to graphene. 11,12 The MAX phase composition is M n+1 AX n , where M is an early transition metal, A is an A-group element (mostly group 13 and 14 elements), X is carbon and/or nitrogen, and n = 1 to 3. The exfoliation process is carried out by selectively etching away the 'A' layers by hydrofluoric acid (HF) alone or by hydrochloric acid (HCl) combined with pre-dissolved fluoride salts. [13][14][15][16] The resulting material consists of loosely bonded layers of M n+1 X n T x , where T represents surface functionalization by -OH, -F and/or -O groups, [17][18][19] that can subsequently be delaminated...

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Section: Resultsmentioning

confidence: 99%

Electrophoretic Deposition of Two-Dimensional Titanium Carbide (MXene) Thick Films

Collini

Kota

Dillon

et al. 2017

J. Electrochem. Soc.

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“…Anne et al reported on a current drop caused by the increased resistance of the formed deposit, which can be explained by increasing the thickness of the deposited powder bed, by the formation of an ion-depletion layer (Van Tassel and Randall, 2007), mass transport limitations (Koura et al, 1995), etc. As discussed by Van der Biest (Van der Biest et al, 2004) the resistivity of the deposit is a combination of the powder bed and the resistivity of the interparticle electrolyte liquid. In the case of the electrophoretic deposition of PEEK in an aqueous medium, the resistance of the deposit appeared to be very dependent on the migration of ions and electrochemical reactions occurring at the electrodes (water decomposition, reduction of Na + ), which influenced the conductivity of the electrolyte within the deposit.…”

Section: Discussionmentioning

confidence: 99%

Aqueous electrophoretic deposition of bulk polyether ether ketone (PEEK)

Iveković

Novak

Lukek

et al. 2015

Journal of Materials Processing Technology

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“…The electrophoretic deposition (EPD) is an effective technique that allows theshapingoffree standing objects, and also to deposit thick films on substrates starting from liquid suspensions of ceramic powders and by application of direct current (DC) potentials. This method employs the phenomenon of the movement of colloidal particles suspended in a medium when subjected to an electric field 9,10 . Recent investigations have been undertaken on the electrophoretic deposition of barium titanate films [11][12][13][14] , however, only few of theseone were successful in obtaining dense ceramic films with a uniform microstructure and morphology.…”

Section: Introductionmentioning

confidence: 99%

Electrophoretic deposition of BaTi0.85Zr0.15O3 nanopowders

et al. 2013

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The present study reports the results of thick films (20-130 µm) produced through electrophoretic deposition of BaTi 0.85 Zr 0.15 O 3 (BTZ) nanometric powders synthesized by the Pechini's method. The BTZ powderscalcined at 600°C/2h presented a single crystalline phase with an average particle size of ~20nm. To thick films deposition, a stable suspension of acetylacetone (Acac) and ethanol (EtOH)was prepared and the powder was deposited on platinum substrates. The viscosity of BTZ powders suspensions as a function of operational pH (OpH)was measured and the reactions between nanoparticles and the media were discussed. A milling process was used to deagglomerate the powders and it had a great influence in the suspension stability and deposition of thick films. Dense and crack-free thick films were obtained after sintering at 1220 °C/1h. The dielectric properties results, comparable with those of bulk BTZ ceramics, suggested potential applications of the EPD process for the deposition of ferroelectric/piezoelectric thick films.

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Electrophoretic deposition for coatings and free standing objects

Cited by 47 publications

References 8 publications

Electrophoretic Deposition of Two-Dimensional Titanium Carbide (MXene) Thick Films

Electrophoretic Deposition of Two-Dimensional Titanium Carbide (MXene) Thick Films

Aqueous electrophoretic deposition of bulk polyether ether ketone (PEEK)

Electrophoretic deposition of BaTi0.85Zr0.15O3 nanopowders

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