“…HAXPES is able to provide depth sensitivity into the bulk even beyond 50 nm [61,20], thus large enough to perform non-destructive studies of deep regions and buried interfaces [62], e.g., for metal-oxide-semiconductor structures [63], oxide-oxide heterojunctions [64,65], metal-oxide interfaces for nonvolatile memory applications [66,67] or metal-organic interfaces of hybrid spintronic devices [68]. Core level spectra representative for the upper Ti electrode and the underlying PCMO were collected, namely Ti 2p and Mn 2p, for systems set in four different states.…”