2014
DOI: 10.1103/physrevb.90.144107
|View full text |Cite
|
Sign up to set email alerts
|

Electronic structure and mechanical properties of ternary ZrTaN alloys studied byab initiocalculations and thin-film growth experiments

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

2
26
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
8
1

Relationship

1
8

Authors

Journals

citations
Cited by 48 publications
(28 citation statements)
references
References 77 publications
2
26
0
Order By: Relevance
“…NaCl-structure (B1) TiN is a model system for transition-metal (TM) nitrides, a class of technologically important ceramic materials characterized by outstanding combinations of mechanical [23][24][25][26][27], physical [28,29], optical [30,31], electrical [32], and catalytic properties [33,34]. In addition, the properties can be tuned by varying TM compositions in alloys [32,[35][36][37][38] and/or the N/TM ratio [39][40][41][42][43] over wide ranges while preserving the cubic phase.…”
Section: Introductionmentioning
confidence: 99%
“…NaCl-structure (B1) TiN is a model system for transition-metal (TM) nitrides, a class of technologically important ceramic materials characterized by outstanding combinations of mechanical [23][24][25][26][27], physical [28,29], optical [30,31], electrical [32], and catalytic properties [33,34]. In addition, the properties can be tuned by varying TM compositions in alloys [32,[35][36][37][38] and/or the N/TM ratio [39][40][41][42][43] over wide ranges while preserving the cubic phase.…”
Section: Introductionmentioning
confidence: 99%
“…Abadias et al [4,5] (Table 3), respectively. These values were more negative than those with similar Zr/(Ta + Zr) ratios reported in our previous study [6], in which the residual stress of the DC-sputtered Ta 1−x Zr x N y thin films (x = 0.17-0.72, y = 1.03-1.09) ranged from 0 to −2.11 GPa.…”
Section: Resultsmentioning
confidence: 99%
“…Ta-rich Ta-Zr-N coatings exhibited enhanced toughness with high hardness [4,5]. In a previous study [6], low-Zr-content Ta 1−x Zr x N y thin films (x = 0-0.17, y = 0.86-1.03) fabricated through conventional reactive direct-current (DC) magnetron co-sputtering exhibited desirable mechanical properties and a restricted increase in surface roughness from 0.9-1.5 nm to 1.2-1.7 nm after annealing at 600 • C in a 15-ppm O 2 -N 2 atmosphere for 4 h. The chemical inertness of these films against commercial moldable SiO 2 -B 2 O 3 -BaO-based glass after 500 thermal cycles was experimentally confirmed.…”
Section: Introductionmentioning
confidence: 99%
“…Fundamental understanding of the origins of toughness is not widely studied, while progress in this area can only be achieved through atomic-and electronic-level understanding of the origins of brittleness vs. ductility. Such studies are, however, relatively few [16][17][18][19]. Ab initio theoretical studies, using density functional theory DFT calculations, are well adapted for such design by providing information concerning the relationship between electronic structure and mechanical properties.…”
Section: Introductionmentioning
confidence: 99%