1998
DOI: 10.1103/physrevb.58.1887
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Electronic structure and charge transfer in α- andβSi3N4and at the

Abstract: Using a self-consistent linear combination of atomic orbitals method based on density-functional theory in a local-density approximation, the electronic structure in the high-temperature ceramics ␣-Si 3 N 4 and ␤-Si 3 N 4 and at the Si͑111͒/Si 3 N 4 ͑001͒ interface have been calculated. The resulting charge transfer suggests that the ionic formula can be written as Si 3 ϩ1.24 N 4 Ϫ0.93 . For the Si͑111͒/Si 3 N 4 ͑001͒ interface, the silicon atoms from the silicon side lose some electrons to the nitrogen atoms … Show more

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Cited by 78 publications
(22 citation statements)
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“…In addition, recently there have been extensive studies of crystalline β-Si 3 N 4 thin films on Si, using either experimental 26 or theoretical techniques. 27,28 However investigations of dielectric properties have been extremely limited. Dielectric properties of amorphous thin film Si 3 N 4 have been studied in experiment, [29][30][31][32] and recently we have provided a theoretical analysis based on DFT.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, recently there have been extensive studies of crystalline β-Si 3 N 4 thin films on Si, using either experimental 26 or theoretical techniques. 27,28 However investigations of dielectric properties have been extremely limited. Dielectric properties of amorphous thin film Si 3 N 4 have been studied in experiment, [29][30][31][32] and recently we have provided a theoretical analysis based on DFT.…”
Section: Introductionmentioning
confidence: 99%
“…1͑a͒ is similar to an interface structure of ␤-Si 3 N 4 ͑0001͒ / Si͑111͒ proposed by Zhao and Bachlechner. 22 Three of the four Ge ͑smaller cyan atoms͒ atoms of the first Ge͑111͒ layer near the interface bond to three N atoms of ␤-Ge 3 N 4 , and the fourth Ge atom is right at the bottom of another N atom of ␤-Ge 3 N 4 . This structure has four dangling bonds at the interface per unit due to the unsaturated four Ge atoms ͓three Ge atoms ͑larger cyan atoms͒ from the first layer of Ge 3 N 4 at the interface and the other one from the first layer of Ge͑111͔͒.…”
mentioning
confidence: 99%
“…We summarize the calculation results in Table II. The chemical shifts observed in our experiment and the effective charges given by other studies 17,20,21 are also listed in the table for comparison. The calculated chemical shift for SiC well reproduces the experimental value.…”
Section: Observation Of Chemical Shifts For Silicon Compoundsmentioning
confidence: 94%