2003
DOI: 10.1081/ma-120025315
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Electronic Properties and Morphology of Beam‐Oligomerized 3‐Hexylthiophene

Abstract: A novel means of lithographically forming fluorescent oligothiophene patterns is demonstrated. MgKa x-ray and low energy electron irradiation of 3-hexylthiophene (3HT) monomer condensed on a cold metal surface result in the formation of photoluminescent films as thick as several microns. The excitation maxima for the x-ray-and electron-formed samples are 350 and 405 nm, respectively, with corresponding emission maxima of 430 and 525 nm, indicating that the films are oligomeric rather than polymeric. Ultraviole… Show more

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Cited by 5 publications
(5 citation statements)
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References 24 publications
(27 reference statements)
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“…C. UPS of 3T SPIAD and Evaporated 6T Films. UPS of the 6T evaporated, 3T SPIAD, and 3T evaporated films in Figure display their lowest binding energy peaks below 3 eV which are assigned as π* antibonding orbitals. These π* antibonding orbitals are of greatest interest to conducting polymer electronic structure and those of the 3T SPIAD film display a continuous band from 1.3 to 1.7 eV binding energy, intermediate between those bands observed for 3T and 6T. All three films display UPS peaks near 4 eV, which are assigned to n nonbonding orbitals, while the groups of peaks from 6 to 10 eV are assigned to π bonding orbitals.…”
Section: Resultsmentioning
confidence: 93%
“…C. UPS of 3T SPIAD and Evaporated 6T Films. UPS of the 6T evaporated, 3T SPIAD, and 3T evaporated films in Figure display their lowest binding energy peaks below 3 eV which are assigned as π* antibonding orbitals. These π* antibonding orbitals are of greatest interest to conducting polymer electronic structure and those of the 3T SPIAD film display a continuous band from 1.3 to 1.7 eV binding energy, intermediate between those bands observed for 3T and 6T. All three films display UPS peaks near 4 eV, which are assigned to n nonbonding orbitals, while the groups of peaks from 6 to 10 eV are assigned to π bonding orbitals.…”
Section: Resultsmentioning
confidence: 93%
“…Despite the demonstrations of e-beam and scanning probe microscopy tools to directly write polymeric, oxide, metallic, or other patterns with nm resolution, understanding of e-beam-driven reactions with organic and metal–organic precursors remains incomplete. Therefore, here, only a preliminary discussion of possible reactions involved in the MOF patterning process is attempted.…”
Section: Discussionmentioning
confidence: 99%
“…The absorption peak appears ∼470 nm and photoluminescence peak appears ∼600 nm when the film was excited by the light ranging from 450 to 490 nm, indicating that the film is composed of conjugated compound. As compared with the spectra of oligomers [ 26 ] and polymers of 3HT [ 29 ], the peak position of the film is similar to those of polymers. Taking the results of FT-IR, visible absorption and photoluminescence spectroscopies into considerations, the film formed by the electron beam irradiation was P3HT.…”
Section: Resultsmentioning
confidence: 82%
“…Although the reaction mechanism of the conjugated monomers under electron beam irradiation has not been fully clarified, it is thought that the reaction mechanism of the electron-beam-assisted electropolymerization is similar to that of conventional electropolymerization based on anodic oxidation [ 26 , 33 ]. To investigate the versatility and formation mechanism of our polymerization method, an electropolymerizable monomer used for cathodic reduction, poly( p -phenylene vinylene), was also examined.…”
Section: Resultsmentioning
confidence: 99%
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