Semiconductors
with electrically tunable band gaps are of great
interest in controlling transparency to electromagnetic radiation.
Thin films of perovskite nickelate NdNiO3 (NNO), a class
of correlated oxides, were deposited on single-crystal (LaAlO3 (LAO)) and polycrystalline (fluorine-doped tin oxide-coated glass (FTO)) substrates by
magnetron sputtering, chemical solution deposition (CSD), and atomic
layer deposition (ALD). Their electrochromic behaviors were investigated
using a three-electrode setup in basic (KOH solution, pH = 12) electrolyte.
During bleaching/coloration process, the proton intercalation/deintercalation
and simultaneous electron compensation in the NNO lattice under electrical
bias led to crossover of the material between the pristine-conducting
phase (Ni3+) and the strongly correlated insulating phase
(Ni2+), which serves as the working principle for electrochromic
(tunable opacity in the visible range) behavior. Cyclic voltammetry
(CV) scans demonstrate that NNO films are electrochemically stable
in basic solutions for all three film deposition methods explored
here. CV scans at varying rates enabled the extraction of diffusion
coefficient of protons in thin film NNO, which is ∼10–7 cm2 s–1 among all films studied. Large
light transmittance modulation by bleaching and coloration was observed
on films grown on both LAO and FTO substrates, suggesting its potential
as an electrochromic material candidate for smart windows and optical
shutter applications. Porous NNO films obtained by chemical solution
deposition tend to demonstrate stronger electrochromic activity than
dense films grown by sputtering or ALD.