“…[33][34][35] To obtain a greater transport contribution from the topological SS, it is important to obtain TI thin lms with a high crystallization quality. The methods usually used for preparing TI thin lms include molecular beam epitaxy (MBE), 33,[36][37][38][39][40] chemical vapor deposition, [41][42][43][44] physical vapor deposition, [45][46][47][48] pulsed laser deposition (PLD) [49][50][51][52][53][54][55][56][57][58][59][60] and sputtering. 61,62 The MBE is the method mainly used to obtain at and thin TI lms for fundamental research, because of its advantages of 2D growth, single crystal yield and easily controlled doping.…”