Electron-beam lithography with character projection exposure for throughput enhancement with line-edge quality optimization

Advanced Colloidal Lithography Beyond Surface Patterning

“…In this scenario, development of nanofabrication methodologies to manufacture materials with controlled structural features becomes crucial for structure‐based applications. The most widely used nanofabrication techniques rely on conventional lithography (hard lithography), including photolithography, electron beam lithography, focused ion beam lithography, atomic force microscopic lithography and etc. Photolithography is largely limited by its low, diffraction‐limited resolution, while electron beam lithography, focused ion beam lithography, and atomic force microscopic lithography are capable of precise control over the size, shape, and spacing of metallic nanostructures but limited by high‐cost, low‐throughput and requirement of sophisticated equipment.…”