2020
DOI: 10.1021/acsami.0c14694
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Electrogravimetry and Structural Properties of Thin Silicon Layers Deposited in Sulfolane and Ionic Liquid Electrolytes

Abstract: Potentiostatic deposition of silicon is performed in sulfolane (SL) and ionic liquid (IL) electrolytes. Electrochemical quartz crystal microbalance with damping monitoring (EQCM-D) is used as main analytical tool for the characterization of the reduction process. The apparent molar mass (M app ) is applied for in situ estimation of the layer contamination. By means of this approach, appropriate electrolyte composition and substrate type are selected to optimize the structural properties of the layers. The appl… Show more

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Cited by 6 publications
(13 citation statements)
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References 50 publications
(121 reference statements)
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“…[ 21,34–36 ] The experimentally obtained damping observed at the end of the deposition period conforms very well with the theoretically predicted values corresponding to these roughness parameters. [ 21 ]…”
Section: Resultssupporting
confidence: 78%
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“…[ 21,34–36 ] The experimentally obtained damping observed at the end of the deposition period conforms very well with the theoretically predicted values corresponding to these roughness parameters. [ 21 ]…”
Section: Resultssupporting
confidence: 78%
“…For the SL electrolyte, used for the Si deposition at 298 K, one obtains δ = 500 nm. [ 21 ] Therefore, the electrolyte, trapped in surface cavities with dimension under this limit, will cause a Sauerbrey‐like frequency shift, characteristic for a rigid layer. [ 31 ] However, this quantification will not correspond to the mass of the deposited Si–O–C layer.…”
Section: Resultsmentioning
confidence: 99%
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