Electrodeposition of CoWP Film

Dulal, S.M.S.I.; Yun, Hongseok; Shin, Chee Burm; Kim, Chang‐Koo

doi:10.1149/1.2761834

Cited by 15 publications

(17 citation statements)

References 58 publications

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“…Peaks develop at a potential of -1.14 V in the case of hypophosphite containing electrolytes and the evolution of hydrogen occurs at -1.17 V. Therefore, it can be expected that there will be little or no hydrogen evolution if CoWP films are deposited at a potential more positive than -1.17 V. The polarisation curves of the cobalt, and the cobalt and tungstate containing electrolytes do not show a peak or plateau to indicate a limiting current. It has recently been reported that linear sweep voltammetry at various scan rates suggests that the induced codeposition of cobalt, tungsten and phosphorus from an electrolyte containing cobalt sulphate, sodium tungstate, sodium hypophosphite and tri-sodium citrate occurs via a nucleation process under mass transfer control [23]. Figure 1 also shows that dissolution of the deposits starts at around -0.8 V on the reverse scan when the electrolytes contain cobalt, and cobalt and hypophosphite ions.…”

Section: Methodsmentioning

confidence: 78%

“…A potentiostatic technique was preferred because it was found previously that the surface quality of the deposit plated by this method was better than that of a surface plated under galvanostatic conditions [23]. CoSO 4 Á7H 2 O, Na 2 WO 4 Á2H 2 O and NaH 2 PO 2 ÁH 2 O were used as the sources of cobalt, tungsten and phosphorus, respectively.…”

Section: Methodsmentioning

confidence: 99%

“…1) Fig. 2) that it takes less energy to initiate electrocrystallisation of cobalt (and cobalt-tungsten) from a citrate electrolyte when hypophosphite ions are present in the solution [23].…”

Section: Effect Of Hypophosphite Ion Concentration On Thickness and Cmentioning

confidence: 99%

“…Electrochemical aspects of the deposition of this film have recently been reported [23]. The properties of ternary films like CoWP are crucially dependent on the relative amount of the constituent components.…”

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confidence: 99%

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Electrodeposition of CoWP film II. Effect of electrolyte concentration

et al. 2007

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CoWP films were electrodeposited on coppercoated silicon wafers from citrate electrolyte containing cobalt sulphate, sodium tungstate and sodium hypophosphite at room temperature potentiostatically. The effects of electrolyte concentration on thickness, composition and microstructure of the films were studied. It was observed that the deposition current density and thickness increased with increasing cobalt and hypophosphite ion concentrations, whereas an increase in tungstate ion concentration resulted in a decrease in current density and thickness. Films with larger variations of cobalt (from 64 to 83 at.%), tungsten (from 0.5 to 24 at.%) and phosphorus (from 6 to 21 at.%) were electrodeposited by controlling the concentrations of the electrolytes. X-ray diffraction studies suggested that films containing *20 at.% phosphorus were amorphous while films with lower phosphorus content were crystalline. SEM and AFM examinations showed that the size of crystallites and surface roughness were mainly dependent on the amount of phosphorus present in the films.

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Section: Methodsmentioning

confidence: 78%

Section: Methodsmentioning

confidence: 99%

Section: Effect Of Hypophosphite Ion Concentration On Thickness and Cmentioning

confidence: 99%

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confidence: 99%

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Electrodeposition of CoWP film II. Effect of electrolyte concentration

et al. 2007

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“…Various metallic films have been proposed as capping/barrier layers, including NiReP [7], CoWP [8][9][10][11][12][13], CoWB [14], NiWB [15], NiCoP [16], CoMoP [17], and so on. These films were formed by using wet chemical methods such as electroless and electro plating.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of electrodeposited CoWP capping layers using alkali-metal-free precursors

Namkoung

Lee

Son

et al. 2010

Korean J. Chem. Eng.

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CoWP films, used as a capping layer for a copper interconnection, were electrodeposited using alkalimetal-free precursors, and the effect of the electrolyte concentration on the film characteristics such as the thickness, composition, and microstructure was investigated. The current density and the film thickness increased with the concentration of cobalt, tungsten, and phosphorous precursors. When the cobalt ion concentration in the electrolyte was increased from 0.01 to 0.09 M, the cobalt content in the film increased from 67 to 89 at%, while the tungsten and phosphorous contents decreased from 16 to 0.7 and 17 to 10 at%, respectively. The tungsten and phosphorous contents also increased as their corresponding concentrations increased in the electrolyte. Microstructural analyses showed that the tungsten and phosphorous content in the film greatly affected the crystallinity of the CoWP films electrodeposited using alkali-metal-free precursors.

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Effect of P codeposition on the structure and microhardness of Co–W coatings electrodeposited from gluconate bath

Seenivasan

Bera

2016

Surface & Interface Analysis

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Effects of addition of P to Co-W coatings from gluconate bath using direct current (DC) and pulse current (PC) methods have been investigated in this study. Co-W-P coatings with different P concentrations are prepared by varying hypophosphite concentration in the bath. Current efficiency of the Co-W-P electrodeposition is lower than that for Co-W coatings. Increase in NaH 2 PO 2 concentration increases the cobalt content significantly and decreases the tungsten content drastically. Co-W-P coatings display 'cauliflower-like' morphology and roughness of the coatings increases with increasing P content. As-deposited Co-W-P deposits are amorphous while heat treatment at different temperatures has rendered them crystalline with the precipitation of stable species like, Co 3 W, Co 2 P, etc. Unlike Co-W coatings, Co-W-P shows two-step crystallization in differential scanning calorimetry (DSC) and on heat treatment, which is similar to the behavior of Co-P electrodeposited from gluconate baths. Moreover, inclusion of phosphorous and heat treatment have led to significant increase in microhardness of the Co-W-P coatings. X-ray photoelectron spectroscopy (XPS) studies provide a detailed insight into the nature of Co, W and P species in as-deposited and sputtered coatings. Microhardness of the heat-treated coatings is higher than the as-deposited counterparts and is comparable with that of hard chromium.

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Electrodeposition of CoWP Film

Cited by 15 publications

References 58 publications

Electrodeposition of CoWP film II. Effect of electrolyte concentration

Electrodeposition of CoWP film II. Effect of electrolyte concentration

Characteristics of electrodeposited CoWP capping layers using alkali-metal-free precursors

Effect of P codeposition on the structure and microhardness of Co–W coatings electrodeposited from gluconate bath

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