“…To date, many methods have been used to prepare WO 3 in the form of powders, thin films or colloids, including, for example: sol-gel chemistry [16,[21][22][23][24][25][26], thermal oxidation of tungsten [2,3,5], thermal or e-beam evaporation [27,28], sputtering [3,25,26,29,30] spray pyrolysis [31], pulsed laser deposition [32], and chemical vapor deposition [33]. As pointed out elsewhere [34,35], electrodeposition offers a simple, low-temperature route to thin film preparation and thus WO 3 thin films have been grown by anodic [36,37], and more recently, cathodic [38][39][40][41][42][43][44][45][46][47][48][49] deposition routes. It must be noted that these earlier studies using anodic electrodeposition [36,37] used conditions (e.g., modest deposition potentials) leading to the formation of thin, compact oxide films on the parent metal surface.…”