2014
DOI: 10.1016/j.apsusc.2013.10.153
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Electrochromic performance, wettability and optical study of copper manganese oxide thin films: Effect of annealing temperature

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Cited by 26 publications
(8 citation statements)
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“…For both of the as-burnt and the annealed powders, a series of new absorption bands at 616-500 cm À1 indicate the presence of metal oxide. 29 and then the solid-state redox reaction takes place between CuO and Mn 2 O 3 . 30 In our case, we could expect that Cu 1.5 Mn 1.5 O 4 spinel phase appears at lower temperatures due to the powders have been subjected to combustion process.…”
Section: Resultsmentioning
confidence: 99%
“…For both of the as-burnt and the annealed powders, a series of new absorption bands at 616-500 cm À1 indicate the presence of metal oxide. 29 and then the solid-state redox reaction takes place between CuO and Mn 2 O 3 . 30 In our case, we could expect that Cu 1.5 Mn 1.5 O 4 spinel phase appears at lower temperatures due to the powders have been subjected to combustion process.…”
Section: Resultsmentioning
confidence: 99%
“…When preparing NiO and CuO solvents mixing the solutions with different ratios as shown in Table ( (10)(11)(12)(13)(14)(15)(16)(17)(18)(19)(20) minutes to homogeneity.…”
Section: -Experimental Detailsmentioning
confidence: 99%
“…For instances, in fabrication and packaging the microelectronics, especially in integrated circuits (ICs) and mechanical/electrical micro systems (MEMSs), copper thin films as the excellent conductors are extensively used. So far, for fabrication of thin films on various substrates, several methods such as chemical vapor deposition (CVD), sol-gel, pulsedlaser deposition, electro-deposition, magnetron sputtering of a target, wet chemical routes and other methods were used [11][12][13][14][15][16][17]. It is well known that the surface properties such as adhesion, wettability, surface reactivity and catalytic activity are related to the development of a homogeneous thin film on the base material surface.…”
Section: Introductionmentioning
confidence: 99%