1998
DOI: 10.1149/1.1838636
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Electrochemical Studies of Carbon Films from Pyrolyzed Photoresist

Abstract: Carbon film electrodes were prepared by pyrolysis of photoresists on silicon wafers at temperatures ranging from 600 to 1100°C. The physical properties of the carbon films were characterized by scanning and transmission electron microscopies, thermal gravimetric analysis, and four-point probe electrical resistivity measurements. The electrochemical properties of the carbon films were investigated by cyclic voltammetry to observe the kinetics of the Fe(CN)/Fe(CN) redox couple. The carbon film electrodes prepare… Show more

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Cited by 124 publications
(114 citation statements)
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“…32,33 We demonstrate that a combined effect of temperature and dwell time leads to a much improved electrochemical performance of the SU-8 derived carbon. Figure 3A and 3B illustrates that both E and resistivity of our electrodes decrease on extending the dwell time from 1 to 8 hours.…”
Section: Resultsmentioning
confidence: 85%
“…32,33 We demonstrate that a combined effect of temperature and dwell time leads to a much improved electrochemical performance of the SU-8 derived carbon. Figure 3A and 3B illustrates that both E and resistivity of our electrodes decrease on extending the dwell time from 1 to 8 hours.…”
Section: Resultsmentioning
confidence: 85%
“…GC is a very popular, commercially available, electrode material which can be readily polished to an electrochemically active and reproducible state [18]. PPF is prepared in the laboratory and has similar properties to GC but has a much smoother surface, with typical average surface roughness less than 0.5 nm [19][20][21]. This molecular level roughness makes PPF a useful material for imaging molecular layers using atomic force microscopy (AFM).…”
Section: Introductionmentioning
confidence: 99%
“…A new kind of carbon electrode, namely pyrolyzed photoresist carbon electrodes (PPCE), was first proposed by Madou et al [12,13] and is conveniently fabricated employing simple and inexpensive batch fabrication methodologies, namely UV photolithography followed by pyrolysis. The latter is carried out in a flow of N2 gas with a standard temperature ramp-up of about 10 °C •min −1 and a one-hour dwell time at the maximum temperature of 900 °C , followed by the natural cooling of the furnace.…”
Section: Introductionmentioning
confidence: 99%