Electrochemical impedance spectroscopy on nanostructured carbon electrodes grown by supersonic cluster beam deposition

Miniaturized supercapacitors: key materials and structures towards autonomous and sustainable devices and systems

“…2 a) [49] . Characterized by low kinetic energy of the deposited particles, SCBD produces a random stacking of clusters leading to nanostructured materials with high surface-to-volume ratio [50] , [51] . The use of SCBD for the deposition of carbon clusters originates nanostructured carbon (nsC) thin films characterized by a disordered sp 2 structure, a low density (ca.…”

“…The use of SCBD for the deposition of carbon clusters originates nanostructured carbon (nsC) thin films characterized by a disordered sp 2 structure, a low density (ca. 0.5 g cm −3 [51] ) and high specific surface area (ca. 700 m 2 g −1 [52] ) [53] .…”

“…700 m 2 g −1 [52] ) [53] . SCBD process enables the integration of nsC into capacitive electrodes avoiding binders and post-deposition treatments [51] , [54] and was successfully employed for the fabrication of nsC based μSCs on glass and flexible polymeric substrates [47] , [55] . μSCs fabricated on Mylar and employing N -trimethyl- N -propyl-ammonium bis(trifluoromethanesulfonyl) imide (N 1113 TFSI) IL as electrolyte feature cell voltage of 3 V with a capacitance density approaching 10 F cm −3 and maximum specific energy and power densities of 10 mW h cm −3 and 8–10 W cm −3 with long cycling stability over 2 × 10 4 cycles [47] .…”

Flexible conducting polymer transistors with supercapacitor function

“…The ballistic deposition regime of SCBD originates a columnar growth mechanism that results in the formation of nanostructured cluster‐assembled carbon with high porosity . As deposited thin films are characterized by a density of about 0.5 g/cm 3 and a specific surface area of 700 m 2 /g . NsC presents an overall amorphous structure consisting of disordered sp2 domains.…”

“…The electrical conductivity is influenced by the film structure at the nano‐ and meso‐scale and relies on different transport mechanism, such as conduction in extended states, variable range hopping and single‐ and multi‐phonon hopping processes . The deposition of cluster‐assembled nsC on conductive substrates enables the one‐step fabrication of capacitive thin electrodes characterized by a typical electric double layer capacitance of about 80 F/g both in aqueous and in ionic liquid electrolytes . Compared with more traditional physical vapor deposition methods, fabrication of nsC electrodes by SCBD presents several advantages, such as (i) low deposition temperature, compatible with thermolabile flexible and stretchable polymeric substrates, (ii) high deposition rate, (iii) access to a wide range of thicknesses (from a few nanometers to a few micrometers), (iv) compatibility with standard microfabrication techniques, and (v) avoidance of binders and post deposition treatments (e.g., carbon activation) …”