2023
DOI: 10.3390/jmmp7050153
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Electrochemical Growth and Structural Study of the AlxGa1−xAs Nanowhisker Layer on the GaAs Surface

Yana Suchikova,
Sergii Kovachov,
Ihor Bohdanov
et al.

Abstract: This work presents a novel, cost-effective method for synthesizing AlxGa1−xAs nanowhiskers on a GaAs surface by electrochemical deposition. The process begins with structuring the GaAs surface by electrochemical etching, forming a branched nanowhisker system. Despite the close resemblance of the crystal lattices of AlAs, GaAs, and AlxGa1−xAs, our study highlights the formation of nanowhiskers instead of layer-by-layer film growth. X-ray diffraction analysis and photoluminescence spectrum evaluations confirm th… Show more

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Cited by 3 publications
(1 citation statement)
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“…However, recent studies have highlighted certain limitations in the energy conversion efficiency of silicon-based photovoltaic cells [3,4], catalyzing the exploration of alternative semiconducting materials. In this vein, semiconductors such as cadmium telluride (CdTe) [5,6], gallium arsenide (GaAs) [7,8], indium phosphide (InP) [9,10], and complex ternary compounds like Cd x Te y O z [11,12], Al x Ga 1−x As [13,14], and CuGa x In 1−x Se 2 [15,16] have garnered significant attention. Despite the promising attributes of these materials, they are often compromised by high production costs [17].…”
Section: Introductionmentioning
confidence: 99%
“…However, recent studies have highlighted certain limitations in the energy conversion efficiency of silicon-based photovoltaic cells [3,4], catalyzing the exploration of alternative semiconducting materials. In this vein, semiconductors such as cadmium telluride (CdTe) [5,6], gallium arsenide (GaAs) [7,8], indium phosphide (InP) [9,10], and complex ternary compounds like Cd x Te y O z [11,12], Al x Ga 1−x As [13,14], and CuGa x In 1−x Se 2 [15,16] have garnered significant attention. Despite the promising attributes of these materials, they are often compromised by high production costs [17].…”
Section: Introductionmentioning
confidence: 99%