2014
DOI: 10.1016/j.electacta.2013.12.146
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Electrochemical Assembly of Thiol-based Monolayer on Copper for Epoxy-Cu Adhesion Improvement

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Cited by 9 publications
(5 citation statements)
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“…Here, we demonstrate a low‐cost, single‐step hybrid‐layer (HL) solution that during deposition simultaneously reduces the native Cu‐oxide and forms a strong bond to the Cu surface. The HL, synthesized through a sol–gel process with organothiol, organosilane, and metal alkoxide precursors, resulted in not only a marked ninefold improvement in adhesion and a substantially suppressed Cu‐migration, but a more efficient Cu‐oxide reduction with a rapid and organic‐solvent‐free process step requiring only 30 s compared to the previously reported 30 min …”
Section: Introductionmentioning
confidence: 92%
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“…Here, we demonstrate a low‐cost, single‐step hybrid‐layer (HL) solution that during deposition simultaneously reduces the native Cu‐oxide and forms a strong bond to the Cu surface. The HL, synthesized through a sol–gel process with organothiol, organosilane, and metal alkoxide precursors, resulted in not only a marked ninefold improvement in adhesion and a substantially suppressed Cu‐migration, but a more efficient Cu‐oxide reduction with a rapid and organic‐solvent‐free process step requiring only 30 s compared to the previously reported 30 min …”
Section: Introductionmentioning
confidence: 92%
“…Unlike aluminum oxide (Al 2 O 3 ) which is dense and tenacious, the native Cu‐oxide is voluminous and weak, and acts as a weak interlayer preventing sufficient adhesion . Multiprocess and multilayer solutions do exist to promote adhesion such as the use of electroless‐plating in conjunction with heat treatment to control the formation/structure of the Cu oxide, the use of hot alkaline solutions as an oxide forming agent, and the combined use of a chemical reducing pretreatment followed by an organic‐solvent‐based self‐assembly of organothiol monolayer . These processes are, however, generally expensive and not compatible with low‐vcost manufacturing.…”
Section: Introductionmentioning
confidence: 99%
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“…SAM films of some organic molecules formed on metal substrates have been used in many devices and industrial applications (bio-sensors, heat exchangers, microelectronics, conductive circuit boards, electrical switches, and pumps are some examples) owing to their features such as high coverage, fast film-forming, low cost, few defects, and favorable efficiency. [35][36][37][38] Müller and co-worker [39] reported that SAM films can be used for corrosion protection copper as well as sensor or biosensor for biomolecules and as transistors and switches for electronic devices. For all that the metal coverage has an enormous impact on the catalytic activity regarding CO oxidation as well as methanol electrooxidation in the presence of 4,4 0 -dithiodipyridine SAM film on Au (111) electrodes.…”
Section: Introductionmentioning
confidence: 99%
“…Electroassisted adsorption of organothiol molecules on active metals has been reported. 24 With this approach, high-quality SAMs are formed in much shorter periods of time on gold as well as on oxidizable metals and alloys such as nickel 25 and copper. 26 More recently, Metoki et al 27 have investigated the electrochemical formation of alkylphosphonic acids SAMs on the surface of a Ti-6Al-4V alloy.…”
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confidence: 99%