2006
DOI: 10.1049/el:20061076
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Electrically driven single quantum dot polarised single photon emitter

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Cited by 60 publications
(41 citation statements)
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“…Summary of the devices reviewed in this paper ( T O = operation temperature, LT = low temperature, HT = high temperature, RT = room temperature, X = Exciton, XX = biexciton, PE = Purcell enhancement, RR = repetition rate). SPS GaAs p-i-n InAs QDs [10] X 892 1.02 80 5 XX 889 0.47 SPS electrically contacted gold nanocluster arrays [54] 680-730 0.4 220 RT SPS GaAs p-i-n InAs QDs Al 0.98 Ga 0.02 As planar microcavity [56] X 909.3 1.4 1000 5 XX 908.1 0.5 SPS GaAs p-i-n InAs QDs AlOx aperture [70] X 896.0 0.45 80 5 XX 898.1 SPS GaAs p-i-n InAs QDs AlGaO aperture and cavity [71][72][73] X 950. SPS GaAs p-i-n InAs QDs planar cavity with oxide confi nement [58] ≈935 0.7 (PE 2.5) 500 20…”
Section: Discussionmentioning
confidence: 99%
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“…Summary of the devices reviewed in this paper ( T O = operation temperature, LT = low temperature, HT = high temperature, RT = room temperature, X = Exciton, XX = biexciton, PE = Purcell enhancement, RR = repetition rate). SPS GaAs p-i-n InAs QDs [10] X 892 1.02 80 5 XX 889 0.47 SPS electrically contacted gold nanocluster arrays [54] 680-730 0.4 220 RT SPS GaAs p-i-n InAs QDs Al 0.98 Ga 0.02 As planar microcavity [56] X 909.3 1.4 1000 5 XX 908.1 0.5 SPS GaAs p-i-n InAs QDs AlOx aperture [70] X 896.0 0.45 80 5 XX 898.1 SPS GaAs p-i-n InAs QDs AlGaO aperture and cavity [71][72][73] X 950. SPS GaAs p-i-n InAs QDs planar cavity with oxide confi nement [58] ≈935 0.7 (PE 2.5) 500 20…”
Section: Discussionmentioning
confidence: 99%
“…To this end, individual QDs have been isolated in a diode. [ 71,72 ] MBE was used to grow a diode on semi-insulating (100) GaAs. The LED consisted of an undoped GaAs layer with InAs QDs of low density inserted, a 60 nm thick aperture layer of high aluminium content AlGaAs, and p-and n-type GaAs electrical contact layers.…”
Section: Oxide Aperture Device Designmentioning
confidence: 99%
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“…single photon emitter [1,2], has also increased the need for a better understanding of the growth and modification of quantum dots (QDs). Especially for metal-organic vapor phase epitaxy (MOVPE)-the most important growth method for mass fabrication of III-V semiconductor devices-improving the QD device performance has mostly been limited to empirical trial and error processes.…”
Section: Introductionmentioning
confidence: 99%
“…In this context, a semiconductor quantum dot (QD) is an attractive singlephoton emitter, which has a nearly perfect radiative yield and a stable emission (no blinking or bleaching). Moreover, it benefits from the maturity of semiconductor technology and can be incorporated into the intrinsic region of a p-i-n structure, to realize a single-photon LED [2][3][4][5][6][7]. For all potential applications, the efficiency ε of the source, defined here as the probability to collect a photon into the first lens of the optical setup, is a key figure of merit.…”
Section: Introductionmentioning
confidence: 99%