2008
DOI: 10.1016/j.jcrysgro.2008.07.047
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Ripening of InAs quantum dots on GaAs (001) investigated with in situ scanning tunneling microscopy in metal–organic vapor phase epitaxy

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Cited by 16 publications
(11 citation statements)
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“…This result means that a partially stable condition to maintain the QD size appeared in this growth condition. In addition, the speed of ripening was considerably faster than that of the results reported for In(Ga)As QDs although the substrate temperature was lower than them [45,48,49]. We believe these features were caused by the Bi adatoms, which remained on the sample surface after the QD growth.…”
Section: Unique Growth Features Of In(ga)as Quantum Dots Using Bi As mentioning
confidence: 63%
See 1 more Smart Citation
“…This result means that a partially stable condition to maintain the QD size appeared in this growth condition. In addition, the speed of ripening was considerably faster than that of the results reported for In(Ga)As QDs although the substrate temperature was lower than them [45,48,49]. We believe these features were caused by the Bi adatoms, which remained on the sample surface after the QD growth.…”
Section: Unique Growth Features Of In(ga)as Quantum Dots Using Bi As mentioning
confidence: 63%
“…Regarding QDs, ripening had attracted attention concerning the stability issue of II-VI QDs, since ripening proceeds even at room temperature for uncapped dots [43,44]. For III-V QDs, ripening phenomena have also been observed during growth interruption or annealing process, and various results have been reported [45][46][47][48][49]. Although the ripening phenomena were complex and highly dependent on the materials and growth conditions, unified understanding of this phenomenon has been given by Suemune et al, that the ripening phenomena are not intrinsic nature of materials but are originating from excess surface adatoms or originating from oxide on the surface [50].…”
Section: Unique Growth Features Of In(ga)as Quantum Dots Using Bi As mentioning
confidence: 99%
“…A notable exception of the merely optical in situ approaches are the first MOVPE in situ STM images that were obtained at GaAs(100) surfaces at temperatures up to 650 °C and at atmospheric pressures . Even though the limited resolution is a drawback compared to STM at ambient or cryogenic temperatures, the in situ STM approach was also used to study quantum dot formation …”
Section: Epitaxial Reference Surfacesmentioning
confidence: 99%
“…Interesting in situ approaches include in situ photoluminescence (PL), which was demonstrated to predict the emission wavelength of InGaN QW‐based light emitting diodes (LEDs) already during growth . Ostwald ripening of InAs quantum dots on GaAs(100) could be observed with in situ STM, and a combined RAS/in situ STM study revealed the dependence of InGaAs quantum dot formation on different surface reconstructions . InGaAs quantum dot formation and island nucleation were studied also by in situ ellipsometry …”
Section: Epitaxial Reference Surfacesmentioning
confidence: 99%
“…4,5 Ripening of QDs for diode laser applications has been observed using in-situ scanning tunneling microscopy. 6 A higher surface diffusion in MOVPE, compared to MBE, induces a faster QD formation that can lead to island coalescence, and a bimodal QD size distribution. 7,8 Stacked layers have been employed in optoelectronic applications in order to enhance the three-dimensional confinement effects.…”
Section: Introductionmentioning
confidence: 99%