Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum

Electron-Induced Surface Reactions of η3-Allyl Ruthenium Tricarbonyl Bromide [(η3-C3H5)Ru(CO)3Br]: Contrasting the Behavior of Different Ligands

“…5, 6 There are numerous potential applications of EBID, particularly in the area of prototyping nanostructures; current commercial uses include the repair of extreme ultraviolet light lithography (EUVL) masks 7−9 and the production of custom tips for scanning tunneling 10 and atomic force microscopies. 11,12 For the full potential of EBID to be realized, however, one major challenge relating to the high levels of organic contamination found in EBID nanostructures must be overcome. 3,13 These impurities negatively impact properties such as resistivity and conductivity, limiting the current applications of EBID nanostructures.…”

Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

“…2a) [10], a platinum-based probe grown on top of a commercially available atomic force microscopy (AFM) cantilever (Fig. 2b) [11], a dense pattern of L-shaped structures deposited from MeCpPtMe 3 (Fig. 2c) [12], and a high aspect 3D cobalt nanowire (Fig.…”

Mechanism-based design of precursors for focused electron beam-induced deposition

“…A general mechanism for the decomposition of X-Au-L complexes under FEBID conditions is proposed in Eqs. (8) and (9). [45] Initially, the adsorbed precursor is exposed to the electrons whereupon the neutral L ligand desorbs from the surface forming gaseous L while an X-Au motif remains adsorbed on the surface.…”

“…2). [6][7][8][9][10] Indeed, nanostructures created by FEBID have already garnered broad usage, including a commercial system for repairing extreme ultraviolet lithography masks, [11][12][13][14] customized tips for local probe microscopes, [15,16] and the fabrication and modification of nanophotonic and nanoplasmonic devices. [17][18][19] The potential of FEBID to impact various nanotechnologies has been further enhanced by the development of multi-beam technologies that could transform FEBID into a parallel processing technique for creating nanostructured arrays and devices for larger scale technologic applications.…”