Electrical resistivity of Cu and Nb thin films

Abstract

The electrical resistivity and temperature coefficient of resistivity (TCR) of Cu and Nb thin films have been measured over a range of layer thicknesses between 5.6 nm and 1106 nm. The structure of the films has been characterized using transmission electron microscopy (TEM) and x-ray diffraction. The experimental results have been compared with the semi-classical theory of thin-film resistivity due to Dimmich. The grain boundary reflectivity, R, has been found to vary with grain size in the Nb films. Dimmich's theoretical expression for the TCR does not match experiment, but by adapting the theoretical treatment a satisfactory fit has been obtained. The semi-classical expression predicts a negative TCR for certain thin-film and multilayer systems without the need to appeal to localization or correlation.

Monitoring of intermetallic phase formation in jelly-rolled Nb/Al multifilamentary conductors by in-situ resistometry

“…The electrical resistivity and TCR of Nb thin films have been measured over a range of layer thicknesses between 5.6 and 1106 nm [12]. The measured resistivity is about 30 mO cm, which is higher than bulk value of 15.2 mO cm for films thicker than 30 nm.…”

“…The measured resistivity is about 30 mO cm, which is higher than bulk value of 15.2 mO cm for films thicker than 30 nm. It rapidly increases as film thickness decreases; an average resistivity of 199 mO cm can be reached for a 5 nm thick Nb film [12]. The resistivity of Al thin films is approximately 4.4 mO cm for films thicker than w200 nm (the bulk value is 2.65 mO cm) and it rapidly increases as the film thickness drops below this value [13].…”

“…Experimentally, it is found that in a thin metal film the electrical resistivity increases and the temperature coefficient of resistivity (TCR) decreases as the thickness of the metal layer is reduced [12]. The electrical resistivity and TCR of Nb thin films have been measured over a range of layer thicknesses between 5.6 and 1106 nm [12].…”

Macrocyclic Cr3+, Mn2+ and Fe3+ complexes of a mimic SOD moiety: Design, structural aspects, DFT, XRD, optical properties and biological activity

“…In 13 C NMR spectrum of H 2 DPD, the signal appeared in the regions 114.0-115. 38 and 122.7-161.9 are assigned to aliphatic and aromatic C=C while those of C=N and C-C aliphatic appeared at 194.3 ppm and 28.0-50.2 ppm. The electronic absorption spectra of H 2 DPD, as well as its metal complexes were displayed in Nujol, and the data are listed in Table 3.…”

“…Also, the band gap (E g ) value was obtained using Tauc's formula: [36] αÁhυ Where α expresses the absorption coefficient. For the allowed direct transitions, m equals 2 [37] , and A is a parameter, determined using the following relation: [38]…”