Electrical properties of sub-100nm Cu films deposited by electroless plating on amino-terminated silicon oxide activated with Au nano-particles

Inberg, Alexandra; Glickman, E.; Asher, T.; Fishelson, Nick; Shacham‐Diamand, Yosi

doi:10.1016/j.surfcoat.2009.08.028

Cited by 19 publications

(11 citation statements)

References 22 publications

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“…(a), the N 1 s spectrum can be divided into two peaks, an intense peak at 399.0 eV (the red line) and a weak shoulder peak at 410.0 eV (the blue line). The low binding energy corresponds to the free amine group (NH 2 ) from APTMS and the high binding energy originates from the protonated amines (NH + 3 ) . As shown in Fig.…”

Section: Resultsmentioning

confidence: 96%

Nanosilica‐immobilized UV absorber: synthesis and photostability of polyolefins

Liu

Gao

Han

et al. 2015

Polymer International

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A nanosilica-immobilized UV absorber (SiO 2 -APTMS-UVA) was prepared by the following methods: the fumed nanosilica was first modified with an aminosilane coupling agent 3-aminopropyltrimethoxysilane (APTMS) and then reacted with hydroxy-benzoyl chloride. Several measurements confirmed that the UV absorber was chemically immobilized on the surface of the nanosilica. SEM observation showed that SiO 2 -APTMS-UVA was homogeneously dispersed in the matrix of low density polyethylene (LDPE) and polypropylene (PP). The photo-degradation of the nanocomposites was evaluated by an accelerated aging test. It was found that the SiO 2 -APTMS-UVA has a great effect on preventing the degradation of LDPE or PP under UV exposure.

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Section: Resultsmentioning

confidence: 96%

Nanosilica‐immobilized UV absorber: synthesis and photostability of polyolefins

Liu

Gao

Han

et al. 2015

Polymer International

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“…4. In reality, the actual nanoclusters are not hexagonal (this would have been observed with STM, high resolution scanning electron microscopy, or transmission electron microscopy [17,68,69]) and the distance between the Au atoms can change depending on the cluster size and shape and the substrate material [17,70]. Nevertheless, the smallest Au clusters on surfaces are flat and one atomic layer thick, so that this approximation is sufficient to illustrate the basic physics of how the NF depends on cluster size.…”

Section: Modelmentioning

confidence: 99%

Inhomogeneous charge distribution across gold nanoclusters measured by scattered low energy alkali ions

2018

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The neutralization of low energy Na + and Li + ions scattered from Au nanoclusters formed by deposition onto oxide surfaces decreases as the cluster size increases. An explanation for this behavior is provided here, which is based on the notion that the atoms in the clusters are not uniformly charged, but that the edge atoms are positively charged while the center atoms are nearly neutral. This leads to upward pointing dipoles at the edge atoms that increase the neutralization probability of alkali ions scattered from those atoms. As the clusters increase in size, the number of edge atoms relative to the number of center atoms decreases, so that that the average neutralization also decreases. Calculations employing this model are compared to experimental data and indicate good agreement if the strengths of the dipoles at the edge atoms are assumed to decrease with cluster size. This model also explains differences in the neutralization probabilities of scattered

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“…Moreover, the insertion of a self-assembled-monolayer (SAM) to the formation of these layers is effective to produce conformal and thin film [84][85][86][87].…”

Section: Sam Activationmentioning

confidence: 99%

30 years of electroless plating for semiconductor and polymer micro-systems

Shacham‐Diamand

Osaka

Okinaka

et al. 2015

Microelectronic Engineering

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144

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Electroless deposition (ELD) is a well-known method for preparing thin films of metals and their alloys. It is a highly selective method allowing additive patterning of isolated and embedded structures on insulating substrates, e.g. glass, plastic or ceramic. It is a relatively low temperature (less than the boiling point of the electrolyte) and low cost process compared to other physical and chemical vapor deposition methods. ELD features uniform and normally conformal deposition (additives may affect its conformality) with low defect density and some unique material properties. In the last 30 years electroless plating of metals (e.g. copper, gold, nickel, cobalt, palladium, iron, silver, etc.) and their alloys, was demonstrated for micro system applications: microelectronics, micro electro mechanics, micro electro optics and microfluidics, micro fuel cells, micro batteries etc. Electroless plating was also demonstrated on nano structures, both artificial and natural. In this paper we present a short tribute to the recent advances in electroless plating in the last 30 years. Those advances and innovations are due to the work of many scientists and engineers on a time span started in the 19 th century. The progress in electroless plating followed the need and the trend for better metallization technologies for complex structures with critical dimensions that had been shrinking continuously in the last few decades.

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Electrical properties of sub-100nm Cu films deposited by electroless plating on amino-terminated silicon oxide activated with Au nano-particles

Cited by 19 publications

References 22 publications

Nanosilica‐immobilized UV absorber: synthesis and photostability of polyolefins

Nanosilica‐immobilized UV absorber: synthesis and photostability of polyolefins

Inhomogeneous charge distribution across gold nanoclusters measured by scattered low energy alkali ions

30 years of electroless plating for semiconductor and polymer micro-systems

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