In the present paper, we report the results of our investigation, which aims to upgrade the GaInAsSb-based photodiode heterostructure technology. The main requirements on GaInAsSb solid solutions from the viewpoint of nearinfrared photodiode applications are considered. Such methods for decreasing a carrier concentration in the epitaxial layers of the solid solutions as doping with a donor impurity, the use of rare-earth element Yb, growth from lead containing melt are discussed. The possibility of decreasing the GaInAsSb band gap resulting in long-wavelength photosensitivity threshold shift is demonstrated. We have made GaInAsSb/GaA1AsSb photodiodes with the longwavelength photosensitivity threshold of 2.4 .tm. At -2V reverse bias a lowest dark current density is 3x iO A/cm2, and the a quantum efficiency is 60-70% at 2=2.O-2. 1.tm,