The experimental data of the temperature‐dependent Hall‐effect measurements on a Si‐doped n‐type and a Mg‐doped p ‐type sample of GaN, both of which exhibit the characteristic of hopping conduction among impurity sites, have been analyzed. For the n‐GaN sample, Efros‐Shklovskii variable‐range hopping among donor sites has been proved to be the dominant hopping mechanism, where the hopping drift mobility can be described as μhop ∝ T–1 exp [–(TES/T)1/2]. It is shown that the anomalous increase of the absolute value of the Hall coefficient with decreasing temperature below 25 K can be well fitted with assuming the hopping Hall factor in the form of Ahop ∝ –exp [KES(TES/T)1/2]. For the p‐GaN sample, on the other hand, nearest‐neighbor hopping among acceptor sites has been proved to be the dominant hopping mechanism, where the hopping drift mobility can be described as μhop ∝ T–3/2 exp (–T3/T). It is shown that the anomalous sign change of the Hall coefficient to negative below 110 K can be well explained with assuming the hopping Hall factor in the form of Ahop ∝ T exp (KNNHT3/T) with the negative sign.