Electrical properties of carbon nitride thin films: Role of morphology and hydrogen content

Broitman, Esteban; Hellgren, Niklas; Neidhardt, Jörg; Brunell, I.F.; Hultman, Lars

doi:10.1007/s11664-002-0190-8

Cited by 31 publications

(13 citation statements)

References 25 publications

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“…The columnar structure is clearly observed, which to our knowledge, is the first to report such a columnar structure in armophous carbon nitride films deposited by the reactive RF sputtering using only nitrogen gas. E. Broitman et al has reported on a columnar structure in carbon nitride films deposited by DC sputtering from a graphite target in Ar discharges mixed with N 2 (5 %) and H 2 at a substrate temperature of 623 K [23]. All of a-CN x films in this study have such a columnar structure regardless of different deposition conditions as shown in Table 1.…”

Section: Methodssupporting

confidence: 51%

Columnar structured amorphous carbon nitride films

Aono

Kikuchi

Tamura

et al. 2010

Phys. Status Solidi (c)

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Columnar structured amorphous carbon nitride films were deposited by reactive radio frequency magnetron sputtering from a graphite target in glow discharge plasma of nitrogen. The columnar structure was observed in all specimens of the amorphous carbon nitride (a‐CNx) films deposited on substrates of crystalline Si and quartz glass within substrate temperatures between RT and 853 K in nitrogen gas pressure of 0.12 to 0.8 Torr. The average diameter of the columns obtained from SEM was found to be about 40 nm. The results of XRD and FE‐TEM confirmed the columns were amorphous materials. However, the electrical properties reflected clearly the heterogeneous structure of a‐CNx films, i.e., the resistivity in the vertical to a‐CNx columns was lower as compared with that in the horizontal direction (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Section: Methodssupporting

confidence: 51%

Columnar structured amorphous carbon nitride films

Aono

Kikuchi

Tamura

et al. 2010

Phys. Status Solidi (c)

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“…This separation of the wear track from the ball, supposedly by the influence of a humidity-modified film, would also account for the low wear rates. We have previously noticed [11] a significant change of the resistivity of CN x films during exposure to ambient air. It is possible that reactions with absorbed water on the film surface saturate reactive surface sites, which in turn alters the tribo-chemistry of the surface [7].…”

Section: Cn X Friction At the Macroscalementioning

confidence: 91%

The nature of the frictional force at the macro-, micro-, and nano-scales

Broitman

2014

Friction

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Nowadays it is accepted that the friction force is a combined effect arising from various phenomena: adhesive forces, capillary forces, contact elasticity, topography, surface chemistry, and generation of a third body, etc. Any of them can dominate depending on the experimental force and length scales of the study. Typical forces in macro-tribology are in the Newtons, while are reduced to milli-/micro-Newtons, and nano-Newtons in microand nano-tribology, respectively. In this paper, experimental friction results from fullerene like CNx films and single-crystal Si at the three scales will be discussed. The complex and broad variety of processes and phenomena connected with the dry friction coefficient at the macro-, micro-, and nano-scale point of view will be highlighted.

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“…He measured the electrical properties of the coatings as a function of ambient humidity, and proposed the a-CN x film as a novel humidity sensor. In a previous work, we have compared the electrical properties of a-C, a-CN x and FL-CN x films [20]. We reported that after exposure to atmosphere, FL-CN x films were unaffected by humidity, while a-C films were very sensitive to H 2 O vapor exposure.…”

Section: Adsorption Of H 2 O On Cn X Overcoatsmentioning

confidence: 99%