Electrical properties and applications of carbon based nanocomposite materials: An overview

Sanjinés, R.; Abad, M.D.; Vâju, C.; Smajda, Rita; Mionić, Marijana; Magrez, Arnaud

doi:10.1016/j.surfcoat.2011.01.025

Cited by 81 publications

(35 citation statements)

References 94 publications

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“…Furthermore, it has been reported that the conductivity in TiC/a-C:H nanocomposites is suppressed when the amount of the a-C:H matrix separating the TiC grains is increased [15,78]. Moreover, as shown for the WC/a-C system by Sanjinés et al [79], decreased grain sizes will result in increased resistivity due to grain boundary scattering. Here, this relation cannot be confirmed, considering the opposite trends in grain sizes for the two deposition methods as functions of C content as indicated in Figure 4.…”

Section: Resultsmentioning

confidence: 93%

Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions

Samuelsson

Sarakinos

Högberg

et al. 2012

Surface and Coatings Technology

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Titanium carbide (TiC) films were deposited employing high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) in an Ar-C 2 H 2 atmosphere of various compositions. Analysis of the structural, bonding and compositional characteristics revealed that the deposited films are either TiC and hydrogenated amorphous carbon (a-C:H) nanocomposites, nanocrystalline TiC, or Ti/TiC, depending on the C/Ti ratio.It was found that Ti-C films grown by HiPIMS show a C/Ti ratio of close to 1 for a wide C 2 H 2 flow range (4-15 sccm), with free C ranging from 0 to 20%. Thus, films ranging from near stoichiometric single phase TiC to TiC/a-C:H nanocomposites can be synthesized. This was not the case for DCMS, where films grown using similar deposition rates as for HiPIMS *Manuscript Click here to view linked References 2 formed larger fractions of amorphous C matrix, thus being nanocomposites in the same C 2 H 2 (above 4 sccm) flow range. For a C/Ti ratio of 1 the resistivity is low (4-8×10 2 µΩcm) for the HiPIMS films, and high (>100×10 2 µΩcm) for the DCMS films. The hardness also shows a big difference with 20-27 and 6-10 GPa for HiPIMS and DCMS grown films, respectively.

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Section: Resultsmentioning

confidence: 93%

Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions

Samuelsson

Sarakinos

Högberg

et al. 2012

Surface and Coatings Technology

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“…This is connected with the structural changes as outlined above and with the changes in the conduction process. With the addition of metal there is a transition from thermally activated conduction along linkages or chains of sp 2 carbon atoms [44] to a process following a percolation law [45]. With metal clusters surrounded by a carbon matrix, there is a combination of percolation and hopping going on.…”

Section: Electrical Resistivitymentioning

confidence: 99%

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Flege

Hatada

Hanauer

et al. 2017

Advances in Materials Science and Engineering

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Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C 2 H 4 ). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.

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“…Because of the free electrons, it has high electron mobility (250,000 cm 2 /V) [7,8], ballistic transport, and quantum hall effect at room temperature [9]. It is regarded as the world's thinnest material, as well as being transparent (optical transparency:…”

Section: Introductionmentioning

confidence: 99%

Graphene Coating on Copper by Electrophoretic Deposition for Corrosion Prevention

et al. 2017

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Abstract:In this paper, we report the use of a simple and inexpensive electrophoretic deposition (EPD) technique to develop thin, uniform, and transparent graphene oxide (GO) coating on copper (Cu) substrate on application of 10 V for 1 s from an aqueous suspension containing 0.03 wt % graphene oxide. GO was partially reduced during the EPD process itself. The GO coated on Cu was completely reduced chemically by using sodium borohydride (NaBH 4 ) solution. The coatings were characterized by field emission scanning electron microscope (FESEM), Raman spectroscopy, Fourier-transform infrared spectroscopy (FTIR), XRD, and UV/VIS spectrophotometry. Corrosion resistance of the coatings was evaluated by electrochemical measurements under accelerated corrosion condition in 3.5 wt % NaCl solution. The GO coated on Cu and chemically reduced by NaBH 4 showed more positive corrosion potential (E corr ) (−145.4 mV) compared to GO coated on Cu (−182.2 mV) and bare Cu (−235.3 mV), and much lower corrosion current (I corr ) (7.01 µA/cm 2 ) when compared to 15.375 µA/cm 2 for bare Cu indicating that reduced GO film on copper exhibit enhanced corrosion resistance. The corrosion inhibition efficiency of chemically reduced GO coated Cu was 54.40%, and its corrosion rate was 0.08 mm/year as compared to 0.18 mm/year for bare copper.

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Electrical properties and applications of carbon based nanocomposite materials: An overview

Cited by 81 publications

References 94 publications

Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions

Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Graphene Coating on Copper by Electrophoretic Deposition for Corrosion Prevention

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