2005
DOI: 10.1063/1.1896448
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Electrical conduction transition and largely reduced leakage current in aluminum-doped barium strontium titanate thin films heteroepitaxially grown on Ir∕MgO∕Si(100)

Abstract: Ba 0.6 Sr 0.4 Ti 1 − x Al x O 3 (BSTA, x=0, 3 at. %, 6 at. %) thin films have been prepared on Ir∕MgO-buffered silicon substrates by pulsed-laser deposition. All-epitaxial growth of BSTA∕Ir∕MgO∕Si heterostructures has been evidenced by x-ray diffraction and reflection high-energy electron diffraction. A large reduction in the leakage current density of BSTA thin films was observed by aluminum doping. For 3 at. % Al-doped BSTA thin films, the dominant conduction mechanism shows space-charge-limited current beha… Show more

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Cited by 13 publications
(7 citation statements)
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“…The detailed preparation processes about bottom electrode/MgO/TiN/ Si heterostructures have been reported elsewhere [18][19][20][21]. The prepared bottom electrodes exhibit atomic smooth surface and high electrical conductivity.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The detailed preparation processes about bottom electrode/MgO/TiN/ Si heterostructures have been reported elsewhere [18][19][20][21]. The prepared bottom electrodes exhibit atomic smooth surface and high electrical conductivity.…”
Section: Methodsmentioning
confidence: 99%
“…In this work, various epitaxial thin films (Pt, Ir and LSCO) grown on MgO/Si substrates [18][19][20][21] were selected as bottom electrodes for subsequent deposited PMNT films. Through careful optimization of growth conditions, completely (0 0 1)-oriented 0.7 Pb(Mg 1/3 Nb 2/3 )O 3 -0.3PbTiO 3 films have been successfully prepared on Irand LSCO-bottom electrodes buffered Si substrates.…”
Section: Introductionmentioning
confidence: 99%
“…More detailed results about the growth and characterization of MgO/TiN buffer layers can be found in Refs. [13,14]. Finally, for the growth of the LSCO thin films, the oxygen pressure in the chamber was further raised to 200 mTorr, substrate-target distance was kept at 50 mm, laser fluence was controlled at 3 J/cm 2 and substrate temperature was varied from 500 to 750 1C.…”
Section: Methodsmentioning
confidence: 99%
“…The selection of this buffer was inspired due to the following two reasons: (i) MgO can be grown epitaxially on Si substrates by inserting only 1 nm thick TiN [13,14] and (ii) the lattice constant of LSCO and MgO are 0.383 and 0.421 nm, respectively. Thus, a relative low lattice mismatch about 9% exists between them.…”
Section: Introductionmentioning
confidence: 99%
“…The J-E relationships for the three electronic conduction mechanisms are listed in Table 2. Accordingly, the J-E curves of the SCLC, Schottky and Poole-Frenkel conduction (PFC) are characterized by the linear relationships of log(J)-log(E), ln(J)-E 1/2 , and ln(J/E)-E 1/2 respectively [18].…”
Section: Leakage Current Analysismentioning
confidence: 99%